MBE growth and characterization of hexagonal ZnCdSe layers on GaAs(111)-A and -B substrates

被引:0
|
作者
Suzuki, S
Nemoto, T
Kaifuchi, Y
Ishitani, Y
Yoshikawa, A
机构
[1] Kisarazu Natl Coll Technol, Dept Control Engn, Kisarazu 2920041, Japan
[2] Chiba Univ, Dept Elect & Mech Engn, Inage Ku, Chiba 2638522, Japan
[3] Chiba Univ, Ctr Frontier Elect & Photon, Venture Business Lab, Inage Ku, Chiba 2638522, Japan
关键词
D O I
10.1002/1521-396X(200207)192:1<195::AID-PSSA195>3.0.CO;2-8
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Zn0.5Cd0.5Se epilayers were grown on GaAs(111)-A and -B substrates by MBE. We investigated how the polarity of the substrate affects both the epilayer crystalline structure and quality. It was found that the epilayers consisted of hexagonal and cubic phases independent of the substrate polarity. The hexagonal phase content. in the epilayers tended to be minimal at a growth temperature around 300degreesC; it increased with decreasing growth temperature in the range of 200-300degreesC and increased again above 300degreesC. The hexagonal phase content in the epilayers grown on the (111)-B face was relatively high compared with that on the (111)-A face. However, the crystalline quality of the epilayers grown on the (111)-A face was much better. Furthermore, the hexagonal phase content increased for both (111)-A and -B faces with increasing VI/II beam flux ratio. In that case, the epilayer quality was improved on (111)-A face, though it tended to become poor on (111)-B face.
引用
收藏
页码:195 / 200
页数:6
相关论文
共 50 条
  • [41] Material properties of InAlAs layers grown by MBE on vicinal (111)B InP substrates
    Georgakilas, A
    Michelakis, K
    Kayambaki, M
    Tsagaraki, K
    Macarona, E
    Hatzopoulos, Z
    Vila, A
    Becourt, N
    Peiro, F
    Cornet, A
    Chrysanthakopoulos, N
    Calamiotou, M
    JOURNAL OF CRYSTAL GROWTH, 1999, 201 : 248 - 251
  • [42] MBE growth and Raman studies of cubic and hexagonal GaN films on (001)-oriented GaAs substrates
    Liu, HF
    Chen, H
    Li, ZQ
    Wan, L
    Huang, Q
    Zhou, JM
    Yang, N
    Tao, K
    Han, YJ
    Luo, Y
    JOURNAL OF CRYSTAL GROWTH, 2000, 218 (2-4) : 191 - 196
  • [43] Growth and structural characteristics of (Ga,Al)As Bragg reflectors grown by MBE on nominal and vicinal (111)B GaAs substrates
    Guerret-Piécourt, C
    Fontaine, C
    Ponchet, A
    JOURNAL OF CRYSTAL GROWTH, 1999, 201 : 178 - 182
  • [44] TEM CHARACTERIZATION OF THE DEFECT STRUCTURE IN GAAS-LAYERS GROWN ON SI SUBSTRATES BY MBE
    BRUCE, R
    MANDEVILLE, P
    SPRINGTHORPE, AJ
    MINER, CJ
    INSTITUTE OF PHYSICS CONFERENCE SERIES, 1987, (87): : 111 - 116
  • [45] MBE growth of high quality AlInSb/GaSb compound buffer layers on GaAs substrates
    Yong Li
    Xiaoming Li
    Ruiting Hao
    Jie Guo
    Yunpeng Wang
    Abuduwayiti Aierken
    Yu Zhuang
    Faran Chang
    Kang Gu
    Guoshuai Wei
    Xiaole Ma
    Guowei Wang
    Yingqiang Xu
    Zhichuan Niu
    Optical and Quantum Electronics, 2020, 52
  • [46] MBE growth of high quality AlInSb/GaSb compound buffer layers on GaAs substrates
    Li, Yong
    Li, Xiaoming
    Hao, Ruiting
    Guo, Jie
    Wang, Yunpeng
    Aierken, Abuduwayiti
    Zhuang, Yu
    Chang, Faran
    Gu, Kang
    Wei, Guoshuai
    Ma, Xiaole
    Wang, Guowei
    Xu, Yingqiang
    Niu, Zhichuan
    OPTICAL AND QUANTUM ELECTRONICS, 2020, 52 (03)
  • [47] MBE Growth and Characterization of Strained Hg Te(111) Films on CdTe/GaAs
    张健
    张圣熙
    邱小芳
    巫艳
    孙强
    邹进
    李天信
    陈平平
    Chinese Physics Letters, 2020, 37 (03) : 75 - 79
  • [48] MBE Growth and Characterization of Strained Hg Te(111) Films on CdTe/GaAs
    张健
    张圣熙
    邱小芳
    巫艳
    孙强
    邹进
    李天信
    陈平平
    Chinese Physics Letters, 2020, (03) : 75 - 79
  • [49] Nitridation of GaAs(111)B substrates and heteroepitaxial growth of InN on the nitrided substrates
    Yamamoto, A
    Yamauchi, Y
    Ogawa, T
    Ohkubo, M
    Hashimoto, A
    SILICON CARBIDE AND RELATED MATERIALS 1995, 1996, 142 : 879 - 882
  • [50] MBE Growth of MCT on GaAs Substrates at AIM
    Wenisch, J.
    Eich, D.
    Lutz, H.
    Schallenberg, T.
    Wollrab, R.
    Ziegler, J.
    JOURNAL OF ELECTRONIC MATERIALS, 2012, 41 (10) : 2828 - 2832