Field-induced resistive switching in metal-oxide interfaces

被引:248
|
作者
Tsui, S [1 ]
Baikalov, A
Cmaidalka, J
Sun, YY
Wang, YQ
Yue, YY
Chu, CW
Chen, L
Jacobson, AJ
机构
[1] Univ Houston, Dept Phys, Houston Sci Ctr 202, Houston, TX 77204 USA
[2] Univ Houston, Texas Ctr Cuperconduct & Adv Mat, Houston Sci Ctr 202, Houston, TX 77204 USA
[3] Univ Calif Berkeley, Lawrence Berkeley Lab, Berkeley, CA 94720 USA
[4] Hong Kong Univ Sci & Technol, Hong Kong, Hong Kong, Peoples R China
[5] Univ Houston, Dept Chem, Houston, TX 77204 USA
基金
美国国家科学基金会;
关键词
D O I
10.1063/1.1768305
中图分类号
O59 [应用物理学];
学科分类号
摘要
We investigate the polarity-dependent field-induced resistive switching phenomenon driven by electric pulses in perovskite oxides. Our data show that the switching is a common occurrence restricted to an interfacial layer between a deposited metal electrode and the oxide. We determine through impedance spectroscopy that the interfacial layer is no thicker than 10 nm and that the switch is accompanied by a small capacitance increase associated with charge accumulation. Based on interfacial I-V characterization and measurement of the temperature dependence of the resistance, we propose that a field-created crystalline defect mechanism, which is controllable for devices, drives the switch. (C) 2004 American Institute of Physics.
引用
收藏
页码:317 / 319
页数:3
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