Bias dependence in spin-polarized tunneling

被引:49
|
作者
Chui, ST
机构
[1] Bartol Research Institute, University of Delaware, Newark
来源
PHYSICAL REVIEW B | 1997年 / 55卷 / 09期
关键词
D O I
10.1103/PhysRevB.55.5600
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We discuss the transport of electrons through ferromagnetic tunnel junctions. The spin-up and spin-down chemical potentials are different at the insulator-ferromagnet interfaces by different amounts between the parallel and the antiparallel configuration. As a result, the tunneling probabilities fdr the spin-up and spin-down channels change differently as the external voltages are increased. There is a strong bias dependence of the magnetoresistance ratio, consistent with experimental results.
引用
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页码:5600 / 5603
页数:4
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