Investigation of length-dependent characteristics of the voltage-induced metal insulator transition in VO2 film devices
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Yoon, Joonseok
[1
]
Lee, Giyong
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Yonsei Univ, Dept Phys, Seoul 120749, South KoreaYonsei Univ, Dept Phys, Seoul 120749, South Korea
Lee, Giyong
[1
]
Park, Changwoo
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Hanbat Natl Univ, Div Appl Chem & Biotechnol, Taejon 305719, South Korea
Adv Nano Prod, Chungwon 363942, Chungbuk, South KoreaYonsei Univ, Dept Phys, Seoul 120749, South Korea
Park, Changwoo
[2
,3
]
Mun, Bongjin Simon
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Gwangju Inst Sci & Technol, Dept Phys & Photon Sci, Sch Phys & Chem, Kwangju 500712, South Korea
Gwangju Inst Sci & Technol, Ertl Ctr Electrochem & Catalysis, Kwangju 500712, South KoreaYonsei Univ, Dept Phys, Seoul 120749, South Korea
Mun, Bongjin Simon
[4
,5
]
Ju, Honglyoul
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Yonsei Univ, Dept Phys, Seoul 120749, South KoreaYonsei Univ, Dept Phys, Seoul 120749, South Korea
Ju, Honglyoul
[1
]
机构:
[1] Yonsei Univ, Dept Phys, Seoul 120749, South Korea
[2] Hanbat Natl Univ, Div Appl Chem & Biotechnol, Taejon 305719, South Korea
[3] Adv Nano Prod, Chungwon 363942, Chungbuk, South Korea
[4] Gwangju Inst Sci & Technol, Dept Phys & Photon Sci, Sch Phys & Chem, Kwangju 500712, South Korea
[5] Gwangju Inst Sci & Technol, Ertl Ctr Electrochem & Catalysis, Kwangju 500712, South Korea
The characteristics of the voltage-induced metal insulator transition (MIT) of VO2 film devices are investigated as a function of ambient temperature and length. At the onset of voltage-induced MIT, an abrupt formation of a conduction channel is observed within the insulating phase. The carrier density of the device varies with ambient temperature (T-A) and device length (L) across MIT. As the device length is reduced, a statistically random appearance of the conduction channel is observed. Our results suggest that the primary operation principles of the VO2 device can be chosen between Joule heating effect and the electric field effect. (C) 2014 AIP Publishing LLC.
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Elect & Telecommun Res Inst, MIT Device Team, Taejon 305350, South KoreaElect & Telecommun Res Inst, MIT Device Team, Taejon 305350, South Korea
Kim, Bong-Jun
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Seo, Giwan
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Lee, Yong Wook
Choi, Sungyoul
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Elect & Telecommun Res Inst, MIT Device Team, Taejon 305350, South KoreaElect & Telecommun Res Inst, MIT Device Team, Taejon 305350, South Korea
Choi, Sungyoul
Kim, Hyun-Tak
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Elect & Telecommun Res Inst, MIT Device Team, Taejon 305350, South Korea
Univ Sci & Technol, Sch Adv Device Technol, Taejon 305333, South KoreaElect & Telecommun Res Inst, MIT Device Team, Taejon 305350, South Korea
机构:
Yonsei Univ, Dept Phys, Seoul 120749, South KoreaYonsei Univ, Dept Phys, Seoul 120749, South Korea
Lee, Gi Yong
Kim, Howon
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Yonsei Univ, Dept Phys, Seoul 120749, South KoreaYonsei Univ, Dept Phys, Seoul 120749, South Korea
Kim, Howon
Mun, Bongjin Simon
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Gwangju Inst Sci & Technol, Sch Phys & Chem, Dept Phys & Photon Sci, Gwangju 500712, South KoreaYonsei Univ, Dept Phys, Seoul 120749, South Korea
Mun, Bongjin Simon
Park, Changwoo
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Hanbat Natl Univ, Div Appl Chem & Biotechnol, Daejeon 34158, South Korea
Adv Nano Prod, Sejong 30077, South KoreaYonsei Univ, Dept Phys, Seoul 120749, South Korea
Park, Changwoo
Ju, Honglyoul
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Yonsei Univ, Dept Phys, Seoul 120749, South KoreaYonsei Univ, Dept Phys, Seoul 120749, South Korea
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ESPCI ParisTech CNRS UPMC, UMR 8213, Lab Phys & Etud Mat, F-75231 Paris, FranceESPCI ParisTech CNRS UPMC, UMR 8213, Lab Phys & Etud Mat, F-75231 Paris, France
Zimmers, A.
Aigouy, L.
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ESPCI ParisTech CNRS UPMC, UMR 8213, Lab Phys & Etud Mat, F-75231 Paris, FranceESPCI ParisTech CNRS UPMC, UMR 8213, Lab Phys & Etud Mat, F-75231 Paris, France
Aigouy, L.
Mortier, M.
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Chimie ParisTech CNRS, UMR 7574, Lab Chim Mat Condensee Paris, F-75231 Paris, FranceESPCI ParisTech CNRS UPMC, UMR 8213, Lab Phys & Etud Mat, F-75231 Paris, France
Mortier, M.
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Sharoni, A.
Wang, Siming
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Univ Calif San Diego, Dept Phys, La Jolla, CA 92093 USA
Univ Calif San Diego, Ctr Adv Nanosci, La Jolla, CA 92093 USA
Univ Calif San Diego, Mat Sci & Engn Program, La Jolla, CA 92093 USAESPCI ParisTech CNRS UPMC, UMR 8213, Lab Phys & Etud Mat, F-75231 Paris, France
Wang, Siming
West, K. G.
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Univ Calif San Diego, Dept Phys, La Jolla, CA 92093 USA
Univ Calif San Diego, Ctr Adv Nanosci, La Jolla, CA 92093 USAESPCI ParisTech CNRS UPMC, UMR 8213, Lab Phys & Etud Mat, F-75231 Paris, France
West, K. G.
Ramirez, J. G.
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Univ Calif San Diego, Dept Phys, La Jolla, CA 92093 USA
Univ Calif San Diego, Ctr Adv Nanosci, La Jolla, CA 92093 USAESPCI ParisTech CNRS UPMC, UMR 8213, Lab Phys & Etud Mat, F-75231 Paris, France
Ramirez, J. G.
Schuller, Ivan K.
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Univ Calif San Diego, Dept Phys, La Jolla, CA 92093 USA
Univ Calif San Diego, Ctr Adv Nanosci, La Jolla, CA 92093 USA
Univ Calif San Diego, Mat Sci & Engn Program, La Jolla, CA 92093 USAESPCI ParisTech CNRS UPMC, UMR 8213, Lab Phys & Etud Mat, F-75231 Paris, France
机构:Dalian University of Technology,Key Laboratory of Materials Modification by Laser, Ion and Electron Beams (Ministry of Education), School of Physics
Hongjun Sun
Bingye Zhang
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机构:Dalian University of Technology,Key Laboratory of Materials Modification by Laser, Ion and Electron Beams (Ministry of Education), School of Physics
Bingye Zhang
Jiming Bian
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机构:Dalian University of Technology,Key Laboratory of Materials Modification by Laser, Ion and Electron Beams (Ministry of Education), School of Physics
Jiming Bian
Minhuan Wang
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机构:Dalian University of Technology,Key Laboratory of Materials Modification by Laser, Ion and Electron Beams (Ministry of Education), School of Physics
Minhuan Wang
Dong Zhang
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机构:Dalian University of Technology,Key Laboratory of Materials Modification by Laser, Ion and Electron Beams (Ministry of Education), School of Physics
Dong Zhang
Lihua Miao
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机构:Dalian University of Technology,Key Laboratory of Materials Modification by Laser, Ion and Electron Beams (Ministry of Education), School of Physics
Lihua Miao
Yingmin Luo
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机构:Dalian University of Technology,Key Laboratory of Materials Modification by Laser, Ion and Electron Beams (Ministry of Education), School of Physics
Yingmin Luo
Journal of Materials Science: Materials in Electronics,
2017,
28
: 16861
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16866