Reactively sputter-deposited titanium oxide coatings with parallel penniform microstructure

被引：0
|
作者：
Rodríguez, J [1 ]
Gómez, M [1 ]
Lu, J [1 ]
Olsson, E [1 ]
Granqvist, CG [1 ]
机构：
[1] Uppsala Univ, Angstrom Lab, Dept Mat Sci, SE-75121 Uppsala, Sweden
来源：
ADVANCED MATERIALS | 2000年 / 12卷 / 05期
关键词：
D O I：
10.1002/(SICI)1521-4095(200003)12:5<341::AID-ADMA341>3.0.CO;2-0
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
Ordered titanium dioxide films with large and controllable microstructure have been prepared by a low temperature sputtering deposition method. The Figure displays the "parallel penniform" structure of the films, which have very large surface area and excellent contact to the underlying substrate, rendering them potentially important for electrochemical and photoelectrochemical applications.
引用
下载
收藏
页码：341 / +
页数：4
相关论文
共 50 条
  • [31] Niobium zirconium nitride sputter-deposited protective coatings
    Debessai, M
    Filip, P
    Aouadi, SM
    APPLIED SURFACE SCIENCE, 2004, 236 (1-4) : 63 - 70
  • [32] Laser crystallization of amorphous sputter-deposited quasicrystalline coatings
    Kustas, F
    Molian, P
    Kumar, AS
    Besser, M
    Sordelet, D
    SURFACE & COATINGS TECHNOLOGY, 2004, 188 : 274 - 280
  • [33] Hydrogen isotopes transport in sputter-deposited tungsten coatings
    Xu, Yue
    Hirooka, Yoshi
    Ashikawa, Naoko
    Nagasaka, Takuya
    FUSION ENGINEERING AND DESIGN, 2017, 125 : 239 - 244
  • [34] Physical Properties of Reactively Sputter-Deposited C-N Thin Films
    Aklouche, N.
    Mosbah, A.
    IRANIAN JOURNAL OF MATERIALS SCIENCE AND ENGINEERING, 2023, 20 (01) : 1 - 13
  • [35] Investigation of the thermal stability of reactively sputter-deposited TiN MOS gate electrodes
    Sjöblom, G
    Westlinder, J
    Olsson, J
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 2005, 52 (10) : 2349 - 2352
  • [36] Structural and electrical characterisation of lanthanum nickelate reactively sputter-deposited thin films
    Briois, P.
    Perry, F.
    Billard, A.
    THIN SOLID FILMS, 2008, 516 (10) : 3282 - 3286
  • [37] Composition and structure of reactively sputter-deposited molybdenum-carbon films.
    Kacim, S
    Binst, L
    Reniers, F
    Bouillon, F
    THIN SOLID FILMS, 1996, 287 (1-2) : 25 - 31
  • [38] PROPERTIES OF REACTIVELY SPUTTER-DEPOSITED TA-N THIN-FILMS
    SUN, X
    KOLAWA, E
    CHEN, JS
    REID, JS
    NICOLET, MA
    THIN SOLID FILMS, 1993, 236 (1-2) : 347 - 351
  • [39] Internal Stress and Microstructure of Zinc Oxide Films Sputter-Deposited with Carbon Dioxide Gas
    Ashida, Toru
    Kato, Kazuhiro
    Omoto, Hideo
    Takamatsu, Atsushi
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2010, 49 (06) : 0655011 - 0655014
  • [40] Microstructure, mechanical and optical properties of TiAlON coatings sputter-deposited with varying oxygen partial pressures
    Schalk, Nina
    Fotso, J. F. Thierry Simonet
    Holec, David
    Fian, Alexander
    Jakopic, Georg
    Terziyska, Velislava L.
    Daniel, Rostislav
    Mitterer, Christian
    JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2016, 49 (02)
12345