Reactively sputter-deposited titanium oxide coatings with parallel penniform microstructure

被引：0
|
作者：
Rodríguez, J [1 ]
Gómez, M [1 ]
Lu, J [1 ]
Olsson, E [1 ]
Granqvist, CG [1 ]
机构：
[1] Uppsala Univ, Angstrom Lab, Dept Mat Sci, SE-75121 Uppsala, Sweden
来源：
ADVANCED MATERIALS | 2000年 / 12卷 / 05期
关键词：
D O I：
10.1002/(SICI)1521-4095(200003)12:5<341::AID-ADMA341>3.0.CO;2-0
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
Ordered titanium dioxide films with large and controllable microstructure have been prepared by a low temperature sputtering deposition method. The Figure displays the "parallel penniform" structure of the films, which have very large surface area and excellent contact to the underlying substrate, rendering them potentially important for electrochemical and photoelectrochemical applications.
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页码：341 / +
页数：4
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