Photoelectron emission microscopy and its application to the study of polymer surfaces

被引：4

作者：

CossyFavre, A ^{[1
]}

Diaz, J ^{[1
]}

Anders, S ^{[1
]}

Padmore, H ^{[1
]}

Liu, Y ^{[1
]}

Samant, M ^{[1
]}

Stohr, J ^{[1
]}

Brown, H ^{[1
]}

Russell, TP ^{[1
]}

机构：

[1] IBM CORP,ALMADEN RES CTR,SAN JOSE,CA 95120

来源：

ACTA PHYSICA POLONICA A | 1997年 / 91卷 / 05期

关键词：

D O I：

10.12693/APhysPolA.91.923

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

The X-ray photoelectron emission microscopy at the Advanced Light Source has a spatial resolution of 0.2 microns at an accelerating voltage of 12 kV. The tunability of the photon energy is used to provide chemical state information using near edge X-ray absorption fine structure spectroscopy on the sub-micrometer scale. The homogeneity of thin films of polymer blends was studied for various film thicknesses. The polystyrene/polyvinylmethylether film of 194 Angstrom showed protrusions of 2-3 mu m diameter with an enriched polystyrene content while the polystyrene/polystyreneacrylonitrile 504 Angstrom thick films showed 5-6 mu m segregated regions without any topological structure.

引用

页码：923 / 927

页数：5

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