Photoelectron emission microscopy and its application to the study of polymer surfaces

被引：4
|
作者：
CossyFavre, A [1 ]
Diaz, J [1 ]
Anders, S [1 ]
Padmore, H [1 ]
Liu, Y [1 ]
Samant, M [1 ]
Stohr, J [1 ]
Brown, H [1 ]
Russell, TP [1 ]
机构：
[1] IBM CORP,ALMADEN RES CTR,SAN JOSE,CA 95120
来源：
ACTA PHYSICA POLONICA A | 1997年 / 91卷 / 05期
关键词：
D O I：
10.12693/APhysPolA.91.923
中图分类号：
O4 [物理学];
学科分类号：
0702 ;
摘要：
The X-ray photoelectron emission microscopy at the Advanced Light Source has a spatial resolution of 0.2 microns at an accelerating voltage of 12 kV. The tunability of the photon energy is used to provide chemical state information using near edge X-ray absorption fine structure spectroscopy on the sub-micrometer scale. The homogeneity of thin films of polymer blends was studied for various film thicknesses. The polystyrene/polyvinylmethylether film of 194 Angstrom showed protrusions of 2-3 mu m diameter with an enriched polystyrene content while the polystyrene/polystyreneacrylonitrile 504 Angstrom thick films showed 5-6 mu m segregated regions without any topological structure.
引用
收藏
页码：923 / 927
页数：5
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