The growth mode change in carbon nanotube synthesis in plasma-enhanced chemical vapor deposition

被引:45
|
作者
Song, IK [1 ]
Cho, YS [1 ]
Choi, GS [1 ]
Park, JB [1 ]
Kim, DJ [1 ]
机构
[1] Chungnam Natl Univ, Dept Mat Sci & Engn, Taejon 305764, South Korea
关键词
carbon nanotubes; growth mode; plasma-enhanced chemical vapor deposition; morphology;
D O I
10.1016/j.diamond.2004.01.006
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We carried out experiments to investigate the origin of the growth modes in CVD synthesis of multi-wall carbon nanotubes. The results obtained show that the mode of CNT growth depends on the adhesion of the catalyst particle to the substrates. While many growths of CNTs via thermal CVD revealed base growth modes, the thermal synthesis of the CNTs on anodic aluminum oxide showed a tip growth mode indicating that the growth method itself does not determine the growth mode. In the syntheses via plasma-enhanced CVD with varying the plasma power, a change between the base- and tip-growth modes could be observed. In the growth process driven thermally, CNTs grew on partially interconnected particles, involving large adhesion force between the grouped particles and substrate, and, therefore the CNTs synthesis in a tip growth mode was difficult. However, in plasma the bombardment effectively isolated nanoparticles and promoted the tip growth mode. (C) 2004 Elsevier B.V. All rights reserved.
引用
收藏
页码:1210 / 1213
页数:4
相关论文
共 50 条
  • [41] Synthesis of Nanostructure Carbon Thin Films by Microwave Plasma-Enhanced Chemical Vapor Deposition
    Wasfi, Ahmed S.
    Humud, Hammad R.
    Ismael, Mohammed E.
    3RD INTERNATIONAL MULTIDISCIPLINARY MICROSCOPY AND MICROANALYSIS CONGRESS (INTERM), 2017, 186 : 67 - 76
  • [42] Synthesis of carbon nanotubes by microwave plasma-enhanced hot filament chemical vapor deposition
    Chiu, Chien-Chao
    Yoshimura, Masamichi
    Ueda, Kazuyuki
    DIAMOND AND RELATED MATERIALS, 2008, 17 (4-5) : 611 - 614
  • [43] SYNTHESIS OF CARBON NANOSTRUCTURES BY PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION USING CATALYST STRUCTURES
    Grigonis, Alfonsas
    Blauzdziunas, Giedrius
    Cernauskas, Marius
    RADIATION INTERACTION WITH MATERIAL AND ITS USE IN TECHNOLOGIES 2012, 2012, : 455 - 458
  • [44] Low temperature synthesis of carbon nanotubes by microwave plasma-enhanced chemical vapor deposition
    Choi, YC
    Bae, DJ
    Lee, YH
    Lee, BS
    Han, IT
    Choi, WB
    Lee, NS
    Kim, JM
    SYNTHETIC METALS, 2000, 108 (02) : 159 - 163
  • [45] Plasma composition during plasma-enhanced chemical vapor deposition of carbon nanotubes
    Bell, MS
    Lacerda, RG
    Teo, KBK
    Rupesinghe, NL
    Amaratunga, GAJ
    Milne, WI
    Chhowalla, M
    APPLIED PHYSICS LETTERS, 2004, 85 (07) : 1137 - 1139
  • [46] Plasma-enhanced chemical vapor deposition of copper
    Awaya, Nobuyoshi
    Arita, Yoshinobu
    Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 1991, 30 (08): : 1813 - 1817
  • [47] PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION
    MOLLER, W
    APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1993, 56 (06): : 469 - 469
  • [48] Analysis of oxidation state of multilayered catalyst thin films for carbon nanotube growth using plasma-enhanced chemical vapor deposition
    Okita, Atsushi
    Ozeki, Atsushi
    Suda, Yoshiyuki
    Nakamura, Junji
    Oda, Akinori
    Bhattacharyya, Krishnendu
    Sugawara, Hirotake
    Sakai, Yosuke
    Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 2006, 45 (10 B): : 8323 - 8329
  • [49] Plasma effects in aligned carbon nanoflake growth by plasma-enhanced hot filament chemical vapor deposition
    Wang, B. B.
    Zheng, K.
    Cheng, Q. J.
    Ostrikov, K.
    APPLIED SURFACE SCIENCE, 2015, 325 : 251 - 257
  • [50] Analysis of oxidation state of multilayered catalyst thin films for carbon nanotube growth using plasma-enhanced chemical vapor deposition
    Okita, Atsushi
    Ozeki, Atsushi
    Suda, Yoshiyuki
    Nakamura, Junji
    Oda, Akinori
    Bhattacharyya, Krishnendu
    Sugawara, Hirotake
    Sakai, Yosuke
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2006, 45 (10B): : 8323 - 8329