Ion implantation by plasma immersion

被引：0
|
作者：
Thomae, R
Bender, H
Halder, J
Hilschert, F
Klein, H
Schafer, J
Seiler, B
机构：
来源：
ION IMPLANTATION TECHNOLOGY - 96 | 1997年
关键词：
D O I：
暂无
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
Plasma immersion ion implantation (PIII) is technique for surface modification. In contrast to conventional ion implantation techniques the target is surrounded by the plasma and then pulse biased to high negative voltages. The plasma is generated in a rf source (13.56MHz) and diffuses into the target processing chamber. In this paper we report on the influence of copper deposition effects on the implantation of oxygen and argon ions into a silicon target.
引用
下载
收藏
页码：757 / 759
页数：3
相关论文
共 50 条
  • [1] Plasma immersion ion implantation
    Xia, Lifang
    Sun, Yue
    Ma, Xinxin
    Lizi Jiaohuan Yu Xifu/Ion Exchange and Adsorption, 1995, 11 (01): : 3 - 6
  • [2] Plasma immersion ion implantation of UHMWPE
    Dong, H
    Bell, T
    Blawert, C
    Mordike, BL
    JOURNAL OF MATERIALS SCIENCE LETTERS, 2000, 19 (13) : 1147 - 1149
  • [3] Plasma-immersion ion implantation
    Thomae, RW
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1998, 139 (1-4): : 37 - 42
  • [4] Plasma immersion ion implantation of polyethylene
    Kondyurin, A
    Karmanov, V
    Guenzel, R
    VACUUM, 2001, 64 (02) : 105 - 111
  • [5] Plasma-immersion ion implantation
    Thomae, Rainer W.
    Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, 1998, 139 (1-4): : 37 - 42
  • [6] Instrumentation for plasma immersion ion implantation
    López-Callejas, R
    Valencia-Alvarado, R
    Muñoz-Castro, AE
    Godoy-Cabrera, OG
    Tapia-Fabela, JL
    REVIEW OF SCIENTIFIC INSTRUMENTS, 2002, 73 (12): : 4277 - 4282
  • [7] Plasma immersion ion implantation and deposition
    You, YZ
    Chun, HG
    Kim, DI
    Lee, JH
    Cha, BC
    Choi, BK
    Lee, JH
    Korus 2005, Proceedings, 2005, : 565 - 567
  • [8] Plasma-immersion ion implantation
    Mantese, JV
    Brown, IG
    Cheung, NW
    Collins, GA
    MRS BULLETIN, 1996, 21 (08) : 52 - 56
  • [9] Ion energy distribution in plasma immersion ion implantation
    Mandl, S
    Brutscher, J
    Gunzel, R
    Moller, W
    SURFACE & COATINGS TECHNOLOGY, 1997, 93 (2-3): : 234 - 237
  • [10] EXACT ION ENERGY IN PLASMA IMMERSION ION IMPLANTATION
    Sakudo, N.
    Ikenaga, N.
    Matsui, K.
    Sakumoto, N.
    2015 42ND IEEE INTERNATIONAL CONFERENCE ON PLASMA SCIENCES (ICOPS), 2015,
12345