Mechanism of two-dimensional electron gas formation in AlxGa1-xN/GaN heterostructures

被引:43
|
作者
Jang, HW [1 ]
Jeon, CM
Kim, KH
Kim, JK
Bae, SB
Lee, JH
Choi, JW
Lee, JL
机构
[1] Pohang Univ Sci & Technol, Dept Mat Sci & Engn, Pohang 790784, South Korea
[2] Kyungpook Natl Univ, Dept Elect & Elect Engn, Taegu 702701, South Korea
[3] Wayne State Univ, Dept Elect & Elect Engn, Detroit, MI 48202 USA
关键词
D O I
10.1063/1.1501162
中图分类号
O59 [应用物理学];
学科分类号
摘要
Mechanism on the formation of two-dimensional electron gas (2DEG) at the interface of undoped AlxGa1-xN with undoped GaN was interpreted through surface band bending observed using synchrotron radiation photoemission spectroscopy. The surface Fermi level was independent of AlxGa1-xN thickness and Al content in AlxGa1-xN, showing Fermi pinning to surface states at 1.6 eV below conduction band minimum. Oxygen donor impurities in undoped AlxGa1-xN, unintentionally doped during the growth, led to the formation of large density of 2DEG (>similar to10(13)/cm(3)) at the AlxGa1-xN/GaN interface via electron generation. (C) 2002 American Institute of Physics.
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收藏
页码:1249 / 1251
页数:3
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