Thin Film Morphologies of Bulk-Gyroid Polystyrene-block-polydimethylsiloxane under Solvent Vapor Annealing

被引：65
|
作者：
Bai, Wubin [1 ]
Hannon, Adam F. [1 ]
Gotrik, Kevin W. [1 ]
Choi, Hong Kyoon [1 ]
Aissou, Karim [1 ]
Liontos, George [2 ]
Ntetsikas, Konstantinos [2 ]
Alexander-Katz, Alfredo [1 ]
Avgeropoulos, Apostolos [2 ]
Ross, Caroline A. [1 ]
机构：
[1] MIT, Dept Mat Sci & Engn, Cambridge, MA 02139 USA
[2] Univ Ioannina, Dept Mat Sci Engn, Ioannina 45110, Greece
来源：
MACROMOLECULES | 2014年 / 47卷 / 17期
基金：
美国国家科学基金会;
关键词：
DIBLOCK COPOLYMER; MOLECULAR-WEIGHT; PHASE; ORIENTATION; ARRAYS; LITHOGRAPHY; PATTERNS; POLY(DIMETHYLSILOXANE); DIMETHYLSILOXANE; TRANSITIONS;
D O I：
10.1021/ma501293n
中图分类号：
O63 [高分子化学（高聚物）];
学科分类号：
070305 ; 080501 ; 081704 ;
摘要：
Thin film morphologies of a 75.5 kg/mol polystyrene-block-polydimethylsiloxane (PS-PDMS) diblock copolymer (SD75) subject to solvent vapor annealing are described. The PS-b-PDMS has a double-gyroid morphology in bulk, but as a thin film the morphology consists of spheres, cylinders, perforated lamellae or gyroids, depending on the film thickness, its commensurability with the microdomain period, and the ratio of toluene:heptane vapors used for the solvent annealing process. The morphologies are described by self-consistent field theory simulations. Thin film structures with excellent long-range order were produced, which are promising for nano patterning applications.
引用
收藏
页码：6000 / 6008
页数：9
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