Directional Self-Assembly of Fluorinated Star Block Polymer Thin Films Using Mixed Solvent Vapor Annealing

被引:6
|
作者
Sung, Seung Hyun [1 ]
Farnham, William B. [2 ]
Burch, Heidi E. [3 ]
Brun, Yefim [4 ]
Qi, Kai [5 ,7 ]
Epps, Thomas H., III [1 ,6 ]
机构
[1] Univ Delaware, Dept Chem & Biomol Engn, Newark, DE 19716 USA
[2] DuPont Cent Res & Dev, Wilmington, DE 19803 USA
[3] DuPont Elect & Imaging, Wilmington, DE 19803 USA
[4] DuPont Ind Biosci, Wilmington, DE 19803 USA
[5] DuPont Transportat & Ind Polymers, Wilmington, DE 19803 USA
[6] Univ Delaware, Dept Mat Sci & Engn, Newark, DE 19716 USA
[7] ANP Technol Inc, Newark, DE 19711 USA
基金
美国国家卫生研究院; 美国国家科学基金会;
关键词
directional alignment; domain spacing; fluorinated block polymer; interaction parameter; segregation strength; star block polymer; PS-B-PMMA; COPOLYMER FILMS; MICROPHASE SEPARATION; SURFACE INTERACTIONS; WETTING BEHAVIOR; PHASE-BEHAVIOR; HIGH CHI; ARCHITECTURE; ORIENTATION; PATTERNS;
D O I
10.1002/polb.24901
中图分类号
O63 [高分子化学(高聚物)];
学科分类号
070305 ; 080501 ; 081704 ;
摘要
We demonstrate the directional alignment of perpendicular-lamellae domains in fluorinated three-armed star block polymer (BP) thin films using solvent vapor annealing with shear stress. The control of orientation and alignment was accomplished without any substrate surface modification. Additionally, three-armed star poly(methyl methacrylate-block-styrene) [PMMA-PS] and poly(octafluoropentyl methacrylate-block-styrene) were compared to their linear analogues to examine the impact of fluorine content and star architecture on self-assembled BP feature sizes and interdomain density profiles. X-ray reflectometry results indicated that the star BP molecular architecture increased the effective polymer segregation strength and could possibly facilitate reduced polymer domain spacings, which are useful in next-generation nanolithographic applications. (c) 2019 Wiley Periodicals, Inc. J. Polym. Sci., Part B: Polym. Phys. 2019
引用
收藏
页码:1663 / 1672
页数:10
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