Scanning tunneling microscopy observations of indium segregation phenomena on GaInAs layer grown by molecular beam epitaxy

被引:0
|
作者
Ohkouchi, S [1 ]
Sugimoto, Y [1 ]
机构
[1] NEC Corp Ltd, Optoelect & High Frequency Device Res Labs, Tsukuba, Ibaraki 3058501, Japan
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中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
The surface structures on a cation-stabilized GaInAs layer grown on an InP(001) substrate were observed using a scanning tunneling microscopy (STM) multi-chamber system equipped with a molecular beam epitaxy facility. The STM image of a cation-stabilized GaInAs surface showed the same structure as that of an In-stabilized InAs surface, which means that the In-stabilized InAs layer was formed on the grown GaInAs layer as a result of the indium segregation. We have also observed the indium segregation phenomena on a GaAs/InAs heterostructure. The STM image of an InAs substrate on which an amount of GaAs equal to half a monolayer was deposited revealed the formation of an InAs layer on the top of a two-dimensionally grown GaAs layer. This InAs layer was caused by the segregation of indium atoms from the InAs substrate through the deposited GaAs layer.
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页码:517 / 521
页数:5
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