Selective deposition contact patterning using atomic layer deposition for the fabrication of crystalline silicon solar cells

被引：5

作者：

Cho, Young Joon ^{[1
]}

Shin, Woong-Chul ^{[2
]}

Chang, Hyo Sik ^{[1
]}

机构：

[1] Chungnam Natl Univ, Grad Sch Energy Sci & Technol, Taejon 305764, South Korea

[2] NCD Co Ltd, Taejon 305509, South Korea

来源：

THIN SOLID FILMS | 2014年 / 568卷

关键词：

Silicon-based solar cells; Passivation; Atomic layer deposition; Selective deposition; Local contact patterning; Al2O3; Polymer paste; SURFACE RECOMBINATION; PASSIVATION;

D O I：

10.1016/j.tsf.2014.07.054

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Selective deposition contact (SDC) patterning was applied to fabricate the rear side passivation of crystalline silicon (Si) solar cells. By this method, using screen printing for contact patterning and atomic layer deposition for the passivation of Si solar cells with Al2O3, we produced local contacts without photolithography or any laser-based processes. Passivated emitter and rear-contact solar cells passivated with ozone-based Al2O3 showed, for the SDC process, an up-to-0.7% absolute conversion-efficiency improvement. The results of this experiment indicate that the proposed method is feasible for conversion-efficiency improvement of industrial crystalline Si solar cells. (C) 2014 Elsevier B. V. All rights reserved.

引用

页码：1 / 5

页数：5

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