A new category of particles at 65nm technology and below

被引：0
|
作者：
Rathei, Dieter [1 ]
Neuber, Andreas [2 ]
机构：
[1] Dr Yield Software & Solut, Graz, Austria
[2] MW Zander, Stuttgart, Germany
来源：
2006 IEEE/SEMI ADVANCED SEMICONDUCTOR MANUFACTURING CONFERENCE AND WORKSHOP | 2006年
关键词：
particle size distribution; yield models; ultrafine particles; semiconductor manufacturing; defect density;
D O I：
暂无
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
We aligned experience from yield analysis with knowledge from aerosol physics and found strong evidence that semiconductor manufacturers will face a new category of particles in the next technology nodes at and below 65nm.
引用
收藏
页码：380 / 382
页数：3
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