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- [33] High power laser-produced plasma source for nano-lithographyLASER-GENERATED AND OTHER LABORATORY X-RAY AND EUV SOURCES, OPTICS, AND APPLICATIONS, 2003, 5196 : 97 - 108Forber, R论文数: 0 引用数: 0 h-index: 0机构: JMAR Technol Inc, Div Res, San Diego, CA 92121 USA JMAR Technol Inc, Div Res, San Diego, CA 92121 USAGaeta, C论文数: 0 引用数: 0 h-index: 0机构: JMAR Technol Inc, Div Res, San Diego, CA 92121 USA JMAR Technol Inc, Div Res, San Diego, CA 92121 USARieger, H论文数: 0 引用数: 0 h-index: 0机构: JMAR Technol Inc, Div Res, San Diego, CA 92121 USA JMAR Technol Inc, Div Res, San Diego, CA 92121 USASiegert, H论文数: 0 引用数: 0 h-index: 0机构: JMAR Technol Inc, Div Res, San Diego, CA 92121 USA JMAR Technol Inc, Div Res, San Diego, CA 92121 USAMcLeod, S论文数: 0 引用数: 0 h-index: 0机构: JMAR Technol Inc, Div Res, San Diego, CA 92121 USA JMAR Technol Inc, Div Res, San Diego, CA 92121 USABoerger, B论文数: 0 引用数: 0 h-index: 0机构: JMAR Technol Inc, Div Res, San Diego, CA 92121 USA JMAR Technol Inc, Div Res, San Diego, CA 92121 USA
- [34] Development of laser-produced plasma based EUV light source technology for HVM EUV lithographyEXTREME ULTRAVIOLET (EUV) LITHOGRAPHY III, 2012, 8322Fujimoto, Junichi论文数: 0 引用数: 0 h-index: 0机构: Gigaphoton Inc, 400 Yokokurashinden, Oyama, Tochigi 3238558, Japan Gigaphoton Inc, 400 Yokokurashinden, Oyama, Tochigi 3238558, JapanHori, Tsukasa论文数: 0 引用数: 0 h-index: 0机构: KOMATSU Ltd, Hiratsuka, Kanagawa 2548555, Japan Gigaphoton Inc, 400 Yokokurashinden, Oyama, Tochigi 3238558, JapanYanagida, Tatsuya论文数: 0 引用数: 0 h-index: 0机构: KOMATSU Ltd, Hiratsuka, Kanagawa 2548555, Japan Gigaphoton Inc, 400 Yokokurashinden, Oyama, Tochigi 3238558, JapanOhta, Takeshi论文数: 0 引用数: 0 h-index: 0机构: KOMATSU Ltd, Hiratsuka, Kanagawa 2548555, Japan Gigaphoton Inc, 400 Yokokurashinden, Oyama, Tochigi 3238558, JapanKawasuji, Yasufumi论文数: 0 引用数: 0 h-index: 0机构: KOMATSU Ltd, Hiratsuka, Kanagawa 2548555, Japan Gigaphoton Inc, 400 Yokokurashinden, Oyama, Tochigi 3238558, JapanShiraishi, Yutaka论文数: 0 引用数: 0 h-index: 0机构: KOMATSU Ltd, Hiratsuka, Kanagawa 2548555, Japan Gigaphoton Inc, 400 Yokokurashinden, Oyama, Tochigi 3238558, JapanAbe, Tamotsu论文数: 0 引用数: 0 h-index: 0机构: KOMATSU Ltd, Hiratsuka, Kanagawa 2548555, Japan Gigaphoton Inc, 400 Yokokurashinden, Oyama, Tochigi 3238558, JapanKodama, Takeshi论文数: 0 引用数: 0 h-index: 0机构: KOMATSU Ltd, Hiratsuka, Kanagawa 2548555, Japan Gigaphoton Inc, 400 Yokokurashinden, Oyama, Tochigi 3238558, JapanNakarai, Hiroaki论文数: 0 引用数: 0 h-index: 0机构: KOMATSU Ltd, Hiratsuka, Kanagawa 2548555, Japan Gigaphoton Inc, 400 Yokokurashinden, Oyama, Tochigi 3238558, JapanYamazaki, Taku论文数: 0 引用数: 0 h-index: 0机构: KOMATSU Ltd, Hiratsuka, Kanagawa 2548555, Japan Gigaphoton Inc, 400 Yokokurashinden, Oyama, Tochigi 3238558, JapanMizoguchi, Hakaru论文数: 0 引用数: 0 h-index: 0机构: Gigaphoton Inc, 400 Yokokurashinden, Oyama, Tochigi 3238558, Japan Gigaphoton Inc, 400 Yokokurashinden, Oyama, Tochigi 3238558, Japan
- [35] High power and short pulse RF-excited CO2 laser MOPA system for LPP EUV light sourceLASER BEAM CONTROL AND APPLICATIONS, 2006, 6101Ariga, T论文数: 0 引用数: 0 h-index: 0机构: EUVA Extreme Ultraviolet Lithog Syst Dev Assoc, 1200 Manda, Hiratsuka, Kanagawa 2548567, Japan EUVA Extreme Ultraviolet Lithog Syst Dev Assoc, 1200 Manda, Hiratsuka, Kanagawa 2548567, JapanHoshino, H论文数: 0 引用数: 0 h-index: 0机构: EUVA Extreme Ultraviolet Lithog Syst Dev Assoc, 1200 Manda, Hiratsuka, Kanagawa 2548567, Japan EUVA Extreme Ultraviolet Lithog Syst Dev Assoc, 1200 Manda, Hiratsuka, Kanagawa 2548567, JapanMiura, T论文数: 0 引用数: 0 h-index: 0机构: EUVA Extreme Ultraviolet Lithog Syst Dev Assoc, 1200 Manda, Hiratsuka, Kanagawa 2548567, Japan EUVA Extreme Ultraviolet Lithog Syst Dev Assoc, 1200 Manda, Hiratsuka, Kanagawa 2548567, JapanEndo, A论文数: 0 引用数: 0 h-index: 0机构: EUVA Extreme Ultraviolet Lithog Syst Dev Assoc, 1200 Manda, Hiratsuka, Kanagawa 2548567, Japan EUVA Extreme Ultraviolet Lithog Syst Dev Assoc, 1200 Manda, Hiratsuka, Kanagawa 2548567, Japan
- [36] Droplet laser plasma source for EUV lithographyPacific Rim Conference on Lasers and Electro-Optics, CLEO - Technical Digest, 2000, : 393 - 394Schriever, G.论文数: 0 引用数: 0 h-index: 0机构: Univ of Central Florida, Orlando, FL, United States Univ of Central Florida, Orlando, FL, United StatesRichardson, M.论文数: 0 引用数: 0 h-index: 0机构: Univ of Central Florida, Orlando, FL, United States Univ of Central Florida, Orlando, FL, United StatesTurcu, E.论文数: 0 引用数: 0 h-index: 0机构: Univ of Central Florida, Orlando, FL, United States Univ of Central Florida, Orlando, FL, United States
- [37] Laser produced EUV light source development for HVMEMERGING LITHOGRAPHIC TECHNOLOGIES XI, PTS 1 AND 2, 2007, 6517Endo, Akira论文数: 0 引用数: 0 h-index: 0机构: EUVA Extreme Ultraviolet Lithog Syst Dev Assoc, 1200 Manda, Hiratsuka, Kanagawa 2548567, Japan EUVA Extreme Ultraviolet Lithog Syst Dev Assoc, 1200 Manda, Hiratsuka, Kanagawa 2548567, JapanHoshino, Hideo论文数: 0 引用数: 0 h-index: 0机构: EUVA Extreme Ultraviolet Lithog Syst Dev Assoc, 1200 Manda, Hiratsuka, Kanagawa 2548567, Japan EUVA Extreme Ultraviolet Lithog Syst Dev Assoc, 1200 Manda, Hiratsuka, Kanagawa 2548567, JapanSuganuma, Takashi论文数: 0 引用数: 0 h-index: 0机构: EUVA Extreme Ultraviolet Lithog Syst Dev Assoc, 1200 Manda, Hiratsuka, Kanagawa 2548567, Japan EUVA Extreme Ultraviolet Lithog Syst Dev Assoc, 1200 Manda, Hiratsuka, Kanagawa 2548567, JapanMoriya, Masato论文数: 0 引用数: 0 h-index: 0机构: EUVA Extreme Ultraviolet Lithog Syst Dev Assoc, 1200 Manda, Hiratsuka, Kanagawa 2548567, Japan EUVA Extreme Ultraviolet Lithog Syst Dev Assoc, 1200 Manda, Hiratsuka, Kanagawa 2548567, JapanAriga, Tatsuya论文数: 0 引用数: 0 h-index: 0机构: EUVA Extreme Ultraviolet Lithog Syst Dev Assoc, 1200 Manda, Hiratsuka, Kanagawa 2548567, Japan EUVA Extreme Ultraviolet Lithog Syst Dev Assoc, 1200 Manda, Hiratsuka, Kanagawa 2548567, JapanUeno, Yoshifumi论文数: 0 引用数: 0 h-index: 0机构: EUVA Extreme Ultraviolet Lithog Syst Dev Assoc, 1200 Manda, Hiratsuka, Kanagawa 2548567, Japan EUVA Extreme Ultraviolet Lithog Syst Dev Assoc, 1200 Manda, Hiratsuka, Kanagawa 2548567, JapanNakano, Masaki论文数: 0 引用数: 0 h-index: 0机构: EUVA Extreme Ultraviolet Lithog Syst Dev Assoc, 1200 Manda, Hiratsuka, Kanagawa 2548567, Japan EUVA Extreme Ultraviolet Lithog Syst Dev Assoc, 1200 Manda, Hiratsuka, Kanagawa 2548567, JapanAsayama, Takeshi论文数: 0 引用数: 0 h-index: 0机构: EUVA Extreme Ultraviolet Lithog Syst Dev Assoc, 1200 Manda, Hiratsuka, Kanagawa 2548567, Japan EUVA Extreme Ultraviolet Lithog Syst Dev Assoc, 1200 Manda, Hiratsuka, Kanagawa 2548567, JapanAbe, Tamotsu论文数: 0 引用数: 0 h-index: 0机构: EUVA Extreme Ultraviolet Lithog Syst Dev Assoc, 1200 Manda, Hiratsuka, Kanagawa 2548567, Japan EUVA Extreme Ultraviolet Lithog Syst Dev Assoc, 1200 Manda, Hiratsuka, Kanagawa 2548567, JapanKomori, Hiroshi论文数: 0 引用数: 0 h-index: 0机构: EUVA Extreme Ultraviolet Lithog Syst Dev Assoc, 1200 Manda, Hiratsuka, Kanagawa 2548567, Japan EUVA Extreme Ultraviolet Lithog Syst Dev Assoc, 1200 Manda, Hiratsuka, Kanagawa 2548567, JapanSoumagne, Georg论文数: 0 引用数: 0 h-index: 0机构: EUVA Extreme Ultraviolet Lithog Syst Dev Assoc, 1200 Manda, Hiratsuka, Kanagawa 2548567, Japan EUVA Extreme Ultraviolet Lithog Syst Dev Assoc, 1200 Manda, Hiratsuka, Kanagawa 2548567, JapanMizoguchi, Hakaru论文数: 0 引用数: 0 h-index: 0机构: EUVA Extreme Ultraviolet Lithog Syst Dev Assoc, 1200 Manda, Hiratsuka, Kanagawa 2548567, Japan EUVA Extreme Ultraviolet Lithog Syst Dev Assoc, 1200 Manda, Hiratsuka, Kanagawa 2548567, JapanSumitani, Akira论文数: 0 引用数: 0 h-index: 0机构: EUVA Extreme Ultraviolet Lithog Syst Dev Assoc, 1200 Manda, Hiratsuka, Kanagawa 2548567, Japan EUVA Extreme Ultraviolet Lithog Syst Dev Assoc, 1200 Manda, Hiratsuka, Kanagawa 2548567, JapanToyoda, Koichi论文数: 0 引用数: 0 h-index: 0机构: EUVA Extreme Ultraviolet Lithog Syst Dev Assoc, 1200 Manda, Hiratsuka, Kanagawa 2548567, Japan EUVA Extreme Ultraviolet Lithog Syst Dev Assoc, 1200 Manda, Hiratsuka, Kanagawa 2548567, Japan
- [38] Development of a plasma laser EUV source for microlithographyJOURNAL DE PHYSIQUE IV, 2003, 108 : 267 - 270Segers, M论文数: 0 引用数: 0 h-index: 0机构: CE Saclay, Grp Applicat Plasmas, CEA, DSM,DRECAM,SPAM, F-91191 Gif Sur Yvette, France CE Saclay, Grp Applicat Plasmas, CEA, DSM,DRECAM,SPAM, F-91191 Gif Sur Yvette, FranceBougeard, M论文数: 0 引用数: 0 h-index: 0机构: CE Saclay, Grp Applicat Plasmas, CEA, DSM,DRECAM,SPAM, F-91191 Gif Sur Yvette, France CE Saclay, Grp Applicat Plasmas, CEA, DSM,DRECAM,SPAM, F-91191 Gif Sur Yvette, FranceCaprin, E论文数: 0 引用数: 0 h-index: 0机构: CE Saclay, Grp Applicat Plasmas, CEA, DSM,DRECAM,SPAM, F-91191 Gif Sur Yvette, France CE Saclay, Grp Applicat Plasmas, CEA, DSM,DRECAM,SPAM, F-91191 Gif Sur Yvette, FranceCeccotti, T论文数: 0 引用数: 0 h-index: 0机构: CE Saclay, Grp Applicat Plasmas, CEA, DSM,DRECAM,SPAM, F-91191 Gif Sur Yvette, France CE Saclay, Grp Applicat Plasmas, CEA, DSM,DRECAM,SPAM, F-91191 Gif Sur Yvette, FranceChichmanian, F论文数: 0 引用数: 0 h-index: 0机构: CE Saclay, Grp Applicat Plasmas, CEA, DSM,DRECAM,SPAM, F-91191 Gif Sur Yvette, France CE Saclay, Grp Applicat Plasmas, CEA, DSM,DRECAM,SPAM, F-91191 Gif Sur Yvette, FranceDescamps, D论文数: 0 引用数: 0 h-index: 0机构: CE Saclay, Grp Applicat Plasmas, CEA, DSM,DRECAM,SPAM, F-91191 Gif Sur Yvette, France CE Saclay, Grp Applicat Plasmas, CEA, DSM,DRECAM,SPAM, F-91191 Gif Sur Yvette, FranceHaltebourg, P论文数: 0 引用数: 0 h-index: 0机构: CE Saclay, Grp Applicat Plasmas, CEA, DSM,DRECAM,SPAM, F-91191 Gif Sur Yvette, France CE Saclay, Grp Applicat Plasmas, CEA, DSM,DRECAM,SPAM, F-91191 Gif Sur Yvette, FranceHergott, JF论文数: 0 引用数: 0 h-index: 0机构: CE Saclay, Grp Applicat Plasmas, CEA, DSM,DRECAM,SPAM, F-91191 Gif Sur Yvette, France CE Saclay, Grp Applicat Plasmas, CEA, DSM,DRECAM,SPAM, F-91191 Gif Sur Yvette, FranceHulin, S论文数: 0 引用数: 0 h-index: 0机构: CE Saclay, Grp Applicat Plasmas, CEA, DSM,DRECAM,SPAM, F-91191 Gif Sur Yvette, France CE Saclay, Grp Applicat Plasmas, CEA, DSM,DRECAM,SPAM, F-91191 Gif Sur Yvette, FranceNormand, D论文数: 0 引用数: 0 h-index: 0机构: CE Saclay, Grp Applicat Plasmas, CEA, DSM,DRECAM,SPAM, F-91191 Gif Sur Yvette, France CE Saclay, Grp Applicat Plasmas, CEA, DSM,DRECAM,SPAM, F-91191 Gif Sur Yvette, FranceSchmidt, M论文数: 0 引用数: 0 h-index: 0机构: CE Saclay, Grp Applicat Plasmas, CEA, DSM,DRECAM,SPAM, F-91191 Gif Sur Yvette, France CE Saclay, Grp Applicat Plasmas, CEA, DSM,DRECAM,SPAM, F-91191 Gif Sur Yvette, FranceSublemontier, O论文数: 0 引用数: 0 h-index: 0机构: CE Saclay, Grp Applicat Plasmas, CEA, DSM,DRECAM,SPAM, F-91191 Gif Sur Yvette, France CE Saclay, Grp Applicat Plasmas, CEA, DSM,DRECAM,SPAM, F-91191 Gif Sur Yvette, France
- [39] Experimental Study on the Temporal Evolution Parameters of Laser-Produced Tin Plasma under Different Laser Pulse Energies for LPP-EUV SourcePHOTONICS, 2023, 10 (12)Chen, Yiyi论文数: 0 引用数: 0 h-index: 0机构: Chinese Acad Sci, Changchun Inst Opt Fine Mech & Phys, State Key Lab Laser Interact Matter, Changchun 130033, Peoples R China Univ Chinese Acad Sci, Yanqihu Campus, Beijing 100049, Peoples R China Chinese Acad Sci, Changchun Inst Opt Fine Mech & Phys, State Key Lab Laser Interact Matter, Changchun 130033, Peoples R ChinaZhao, Chongxiao论文数: 0 引用数: 0 h-index: 0机构: Chinese Acad Sci, Changchun Inst Opt Fine Mech & Phys, State Key Lab Laser Interact Matter, Changchun 130033, Peoples R China Chinese Acad Sci, Changchun Inst Opt Fine Mech & Phys, State Key Lab Laser Interact Matter, Changchun 130033, Peoples R ChinaPan, Qikun论文数: 0 引用数: 0 h-index: 0机构: Chinese Acad Sci, Changchun Inst Opt Fine Mech & Phys, State Key Lab Laser Interact Matter, Changchun 130033, Peoples R China Chinese Acad Sci, Changchun Inst Opt Fine Mech & Phys, State Key Lab Laser Interact Matter, Changchun 130033, Peoples R ChinaZhang, Ranran论文数: 0 引用数: 0 h-index: 0机构: Chinese Acad Sci, Changchun Inst Opt Fine Mech & Phys, State Key Lab Laser Interact Matter, Changchun 130033, Peoples R China Chinese Acad Sci, Changchun Inst Opt Fine Mech & Phys, State Key Lab Laser Interact Matter, Changchun 130033, Peoples R ChinaGao, Yang论文数: 0 引用数: 0 h-index: 0机构: Chinese Acad Sci, Changchun Inst Opt Fine Mech & Phys, State Key Lab Laser Interact Matter, Changchun 130033, Peoples R China Univ Chinese Acad Sci, Yanqihu Campus, Beijing 100049, Peoples R China Chinese Acad Sci, Changchun Inst Opt Fine Mech & Phys, State Key Lab Laser Interact Matter, Changchun 130033, Peoples R ChinaLi, Xiaoxi论文数: 0 引用数: 0 h-index: 0机构: Chinese Acad Sci, Changchun Inst Opt Fine Mech & Phys, State Key Lab Laser Interact Matter, Changchun 130033, Peoples R China Chinese Acad Sci, Changchun Inst Opt Fine Mech & Phys, State Key Lab Laser Interact Matter, Changchun 130033, Peoples R ChinaGuo, Jin论文数: 0 引用数: 0 h-index: 0机构: Chinese Acad Sci, Changchun Inst Opt Fine Mech & Phys, State Key Lab Laser Interact Matter, Changchun 130033, Peoples R China Chinese Acad Sci, Changchun Inst Opt Fine Mech & Phys, State Key Lab Laser Interact Matter, Changchun 130033, Peoples R ChinaChen, Fei论文数: 0 引用数: 0 h-index: 0机构: Chinese Acad Sci, Changchun Inst Opt Fine Mech & Phys, State Key Lab Laser Interact Matter, Changchun 130033, Peoples R China Chinese Acad Sci, Changchun Inst Opt Fine Mech & Phys, State Key Lab Laser Interact Matter, Changchun 130033, Peoples R China
- [40] Performance of a 10 kHz laser-produced-plasma light source for EUV lithographyEMERGING LITHOGRAPHIC TECHNOLOGIES VIII, 2004, 5374 : 160 - 167Abe, T论文数: 0 引用数: 0 h-index: 0机构: Extreme Ultraviolet Lithog Syst Dev Assoc, Hiratsuka Res & Dev Ctr, EUVA, Hiratsuka, Kanagawa 2548567, Japan Extreme Ultraviolet Lithog Syst Dev Assoc, Hiratsuka Res & Dev Ctr, EUVA, Hiratsuka, Kanagawa 2548567, JapanSuganuma, T论文数: 0 引用数: 0 h-index: 0机构: Extreme Ultraviolet Lithog Syst Dev Assoc, Hiratsuka Res & Dev Ctr, EUVA, Hiratsuka, Kanagawa 2548567, Japan Extreme Ultraviolet Lithog Syst Dev Assoc, Hiratsuka Res & Dev Ctr, EUVA, Hiratsuka, Kanagawa 2548567, JapanImai, Y论文数: 0 引用数: 0 h-index: 0机构: Extreme Ultraviolet Lithog Syst Dev Assoc, Hiratsuka Res & Dev Ctr, EUVA, Hiratsuka, Kanagawa 2548567, Japan Extreme Ultraviolet Lithog Syst Dev Assoc, Hiratsuka Res & Dev Ctr, EUVA, Hiratsuka, Kanagawa 2548567, JapanSomeya, H论文数: 0 引用数: 0 h-index: 0机构: Extreme Ultraviolet Lithog Syst Dev Assoc, Hiratsuka Res & Dev Ctr, EUVA, Hiratsuka, Kanagawa 2548567, Japan Extreme Ultraviolet Lithog Syst Dev Assoc, Hiratsuka Res & Dev Ctr, EUVA, Hiratsuka, Kanagawa 2548567, JapanHoshino, H论文数: 0 引用数: 0 h-index: 0机构: Extreme Ultraviolet Lithog Syst Dev Assoc, Hiratsuka Res & Dev Ctr, EUVA, Hiratsuka, Kanagawa 2548567, Japan Extreme Ultraviolet Lithog Syst Dev Assoc, Hiratsuka Res & Dev Ctr, EUVA, Hiratsuka, Kanagawa 2548567, JapanNakano, M论文数: 0 引用数: 0 h-index: 0机构: Extreme Ultraviolet Lithog Syst Dev Assoc, Hiratsuka Res & Dev Ctr, EUVA, Hiratsuka, Kanagawa 2548567, Japan Extreme Ultraviolet Lithog Syst Dev Assoc, Hiratsuka Res & Dev Ctr, EUVA, Hiratsuka, Kanagawa 2548567, JapanSoumagne, G论文数: 0 引用数: 0 h-index: 0机构: Extreme Ultraviolet Lithog Syst Dev Assoc, Hiratsuka Res & Dev Ctr, EUVA, Hiratsuka, Kanagawa 2548567, Japan Extreme Ultraviolet Lithog Syst Dev Assoc, Hiratsuka Res & Dev Ctr, EUVA, Hiratsuka, Kanagawa 2548567, JapanKomori, H论文数: 0 引用数: 0 h-index: 0机构: Extreme Ultraviolet Lithog Syst Dev Assoc, Hiratsuka Res & Dev Ctr, EUVA, Hiratsuka, Kanagawa 2548567, Japan Extreme Ultraviolet Lithog Syst Dev Assoc, Hiratsuka Res & Dev Ctr, EUVA, Hiratsuka, Kanagawa 2548567, JapanTakabayashi, Y论文数: 0 引用数: 0 h-index: 0机构: Extreme Ultraviolet Lithog Syst Dev Assoc, Hiratsuka Res & Dev Ctr, EUVA, Hiratsuka, Kanagawa 2548567, Japan Extreme Ultraviolet Lithog Syst Dev Assoc, Hiratsuka Res & Dev Ctr, EUVA, Hiratsuka, Kanagawa 2548567, JapanMizoguchi, H论文数: 0 引用数: 0 h-index: 0机构: Extreme Ultraviolet Lithog Syst Dev Assoc, Hiratsuka Res & Dev Ctr, EUVA, Hiratsuka, Kanagawa 2548567, Japan Extreme Ultraviolet Lithog Syst Dev Assoc, Hiratsuka Res & Dev Ctr, EUVA, Hiratsuka, Kanagawa 2548567, JapanEndo, A论文数: 0 引用数: 0 h-index: 0机构: Extreme Ultraviolet Lithog Syst Dev Assoc, Hiratsuka Res & Dev Ctr, EUVA, Hiratsuka, Kanagawa 2548567, Japan Extreme Ultraviolet Lithog Syst Dev Assoc, Hiratsuka Res & Dev Ctr, EUVA, Hiratsuka, Kanagawa 2548567, JapanToyoda, K论文数: 0 引用数: 0 h-index: 0机构: Extreme Ultraviolet Lithog Syst Dev Assoc, Hiratsuka Res & Dev Ctr, EUVA, Hiratsuka, Kanagawa 2548567, Japan Extreme Ultraviolet Lithog Syst Dev Assoc, Hiratsuka Res & Dev Ctr, EUVA, Hiratsuka, Kanagawa 2548567, JapanHoriike, Y论文数: 0 引用数: 0 h-index: 0机构: Extreme Ultraviolet Lithog Syst Dev Assoc, Hiratsuka Res & Dev Ctr, EUVA, Hiratsuka, Kanagawa 2548567, Japan Extreme Ultraviolet Lithog Syst Dev Assoc, Hiratsuka Res & Dev Ctr, EUVA, Hiratsuka, Kanagawa 2548567, Japan