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- [1] Laser-produced plasma source development for EUV lithographyALTERNATIVE LITHOGRAPHIC TECHNOLOGIES, 2009, 7271Endo, Akira论文数: 0 引用数: 0 h-index: 0机构: EUVA Gigaphoton Komatsu, Kanagawa 2548567, Japan EUVA Gigaphoton Komatsu, Kanagawa 2548567, JapanKomori, Hiroshi论文数: 0 引用数: 0 h-index: 0机构: EUVA Gigaphoton Komatsu, Kanagawa 2548567, Japan EUVA Gigaphoton Komatsu, Kanagawa 2548567, JapanUeno, Yoshifumi论文数: 0 引用数: 0 h-index: 0机构: EUVA Gigaphoton Komatsu, Kanagawa 2548567, Japan EUVA Gigaphoton Komatsu, Kanagawa 2548567, JapanNowak, Krzysztof M.论文数: 0 引用数: 0 h-index: 0机构: EUVA Gigaphoton Komatsu, Kanagawa 2548567, Japan EUVA Gigaphoton Komatsu, Kanagawa 2548567, JapanTakayuki, Yabu论文数: 0 引用数: 0 h-index: 0机构: EUVA Gigaphoton Komatsu, Kanagawa 2548567, Japan EUVA Gigaphoton Komatsu, Kanagawa 2548567, JapanTatsuya, Yanagida论文数: 0 引用数: 0 h-index: 0机构: EUVA Gigaphoton Komatsu, Kanagawa 2548567, Japan EUVA Gigaphoton Komatsu, Kanagawa 2548567, JapanSuganuma, Takashi论文数: 0 引用数: 0 h-index: 0机构: EUVA Gigaphoton Komatsu, Kanagawa 2548567, Japan EUVA Gigaphoton Komatsu, Kanagawa 2548567, JapanAsayama, Takeshi论文数: 0 引用数: 0 h-index: 0机构: EUVA Gigaphoton Komatsu, Kanagawa 2548567, Japan EUVA Gigaphoton Komatsu, Kanagawa 2548567, JapanSomeya, Hiroshi论文数: 0 引用数: 0 h-index: 0机构: EUVA Gigaphoton Komatsu, Kanagawa 2548567, Japan EUVA Gigaphoton Komatsu, Kanagawa 2548567, JapanHoshino, Hideo论文数: 0 引用数: 0 h-index: 0机构: EUVA Gigaphoton Komatsu, Kanagawa 2548567, Japan EUVA Gigaphoton Komatsu, Kanagawa 2548567, JapanNakano, Masaki论文数: 0 引用数: 0 h-index: 0机构: EUVA Gigaphoton Komatsu, Kanagawa 2548567, Japan EUVA Gigaphoton Komatsu, Kanagawa 2548567, JapanMoriya, Masato论文数: 0 引用数: 0 h-index: 0机构: EUVA Gigaphoton Komatsu, Kanagawa 2548567, Japan EUVA Gigaphoton Komatsu, Kanagawa 2548567, JapanNishisaka, Toshihiro论文数: 0 引用数: 0 h-index: 0机构: EUVA Gigaphoton Komatsu, Kanagawa 2548567, Japan EUVA Gigaphoton Komatsu, Kanagawa 2548567, JapanAbe, Tamotsu论文数: 0 引用数: 0 h-index: 0机构: EUVA Gigaphoton Komatsu, Kanagawa 2548567, Japan EUVA Gigaphoton Komatsu, Kanagawa 2548567, JapanSumitani, Akira论文数: 0 引用数: 0 h-index: 0机构: EUVA Gigaphoton Komatsu, Kanagawa 2548567, Japan EUVA Gigaphoton Komatsu, Kanagawa 2548567, JapanNagano, Hitoshi论文数: 0 引用数: 0 h-index: 0机构: EUVA Gigaphoton Komatsu, Kanagawa 2548567, Japan EUVA Gigaphoton Komatsu, Kanagawa 2548567, JapanSasaki, Youichi论文数: 0 引用数: 0 h-index: 0机构: EUVA Gigaphoton Komatsu, Kanagawa 2548567, Japan EUVA Gigaphoton Komatsu, Kanagawa 2548567, JapanNagai, Shinji论文数: 0 引用数: 0 h-index: 0机构: EUVA Gigaphoton Komatsu, Kanagawa 2548567, Japan EUVA Gigaphoton Komatsu, Kanagawa 2548567, JapanWatanabe, Yukio论文数: 0 引用数: 0 h-index: 0机构: EUVA Gigaphoton Komatsu, Kanagawa 2548567, Japan EUVA Gigaphoton Komatsu, Kanagawa 2548567, JapanSoumagne, Georg论文数: 0 引用数: 0 h-index: 0机构: EUVA Gigaphoton Komatsu, Kanagawa 2548567, Japan EUVA Gigaphoton Komatsu, Kanagawa 2548567, JapanIshihara, Takanobu论文数: 0 引用数: 0 h-index: 0机构: EUVA Gigaphoton Komatsu, Kanagawa 2548567, Japan EUVA Gigaphoton Komatsu, Kanagawa 2548567, JapanWakabayashi, Osamu论文数: 0 引用数: 0 h-index: 0机构: EUVA Gigaphoton Komatsu, Kanagawa 2548567, Japan EUVA Gigaphoton Komatsu, Kanagawa 2548567, JapanKakizaki, Kouji论文数: 0 引用数: 0 h-index: 0机构: EUVA Gigaphoton Komatsu, Kanagawa 2548567, Japan EUVA Gigaphoton Komatsu, Kanagawa 2548567, JapanMizoguchi, Hakaru论文数: 0 引用数: 0 h-index: 0机构: EUVA Gigaphoton Komatsu, Kanagawa 2548567, Japan EUVA Gigaphoton Komatsu, Kanagawa 2548567, Japan
- [2] The development of laser-produced plasma EUV light sourceCHIP, 2022, 1 (03):Yang, De-Kun论文数: 0 引用数: 0 h-index: 0机构: Wuhan Univ, Inst Technol Sci, Wuhan 430072, Peoples R China Wuhan Univ, Inst Technol Sci, Wuhan 430072, Peoples R ChinaWang, Du论文数: 0 引用数: 0 h-index: 0机构: Wuhan Univ, Inst Technol Sci, Wuhan 430072, Peoples R China Wuhan Univ, Inst Technol Sci, Wuhan 430072, Peoples R ChinaHuang, Qiu-Shi论文数: 0 引用数: 0 h-index: 0机构: Tongji Univ, Inst Precis Opt Engn, Sch Phys Sci & Engn, Key Lab Adv Microstruct Mat MOE, Shanghai 200092, Peoples R China Wuhan Univ, Inst Technol Sci, Wuhan 430072, Peoples R ChinaSong, Yi论文数: 0 引用数: 0 h-index: 0机构: Wuhan Univ, Inst Technol Sci, Wuhan 430072, Peoples R China Wuhan Univ, Inst Technol Sci, Wuhan 430072, Peoples R ChinaWu, Jian论文数: 0 引用数: 0 h-index: 0机构: East China Normal Univ, State Key Lab Precis Spect, Shanghai 200241, Peoples R China Wuhan Univ, Inst Technol Sci, Wuhan 430072, Peoples R ChinaLi, Wen-Xue论文数: 0 引用数: 0 h-index: 0机构: East China Normal Univ, State Key Lab Precis Spect, Shanghai 200241, Peoples R China Wuhan Univ, Inst Technol Sci, Wuhan 430072, Peoples R ChinaWang, Zhan-Shan论文数: 0 引用数: 0 h-index: 0机构: Tongji Univ, Inst Precis Opt Engn, Sch Phys Sci & Engn, Key Lab Adv Microstruct Mat MOE, Shanghai 200092, Peoples R China Wuhan Univ, Inst Technol Sci, Wuhan 430072, Peoples R ChinaTang, Xia-Hui论文数: 0 引用数: 0 h-index: 0机构: Huazhong Univ Sci & Technol, Sch Opt & Elect Informat, Wuhan 430074, Peoples R China Wuhan Univ, Inst Technol Sci, Wuhan 430072, Peoples R ChinaXu, Hong-Xing论文数: 0 引用数: 0 h-index: 0机构: Wuhan Univ, Sch Phys & Technol, Wuhan 430072, Peoples R China Wuhan Univ, Inst Technol Sci, Wuhan 430072, Peoples R ChinaLiu, Sheng论文数: 0 引用数: 0 h-index: 0机构: Wuhan Univ, Inst Technol Sci, Wuhan 430072, Peoples R China Wuhan Univ, Inst Technol Sci, Wuhan 430072, Peoples R ChinaGui, Cheng-Qun论文数: 0 引用数: 0 h-index: 0机构: Wuhan Univ, Inst Technol Sci, Wuhan 430072, Peoples R China Wuhan Univ, Inst Technol Sci, Wuhan 430072, Peoples R China
- [3] Development of EUV light source by laser-produced plasmaJOURNAL DE PHYSIQUE IV, 2006, 133 : 1161 - 1165Izawa, Y.论文数: 0 引用数: 0 h-index: 0机构: Osaka Univ, Inst Laser Engn, Osaka, Japan Osaka Univ, Inst Laser Engn, Osaka, JapanMiyanaga, N.论文数: 0 引用数: 0 h-index: 0机构: Osaka Univ, Inst Laser Engn, Osaka, JapanNishimura, H.论文数: 0 引用数: 0 h-index: 0机构: Osaka Univ, Inst Laser Engn, Osaka, JapanFujioka, S.论文数: 0 引用数: 0 h-index: 0机构: Osaka Univ, Inst Laser Engn, Osaka, JapanAota, T.论文数: 0 引用数: 0 h-index: 0机构: Osaka Univ, Inst Laser Engn, Osaka, JapanTao, Y.论文数: 0 引用数: 0 h-index: 0机构: Osaka Univ, Inst Laser Engn, Osaka, JapanUchida, S.论文数: 0 引用数: 0 h-index: 0机构: Osaka Univ, Inst Laser Engn, Osaka, JapanShimada, Y.论文数: 0 引用数: 0 h-index: 0机构: Osaka Univ, Inst Laser Engn, Osaka, JapanHashimoto, K.论文数: 0 引用数: 0 h-index: 0机构: Osaka Univ, Inst Laser Engn, Osaka, JapanYamaura, M.论文数: 0 引用数: 0 h-index: 0机构: Osaka Univ, Inst Laser Engn, Osaka, JapanNishihara, K.论文数: 0 引用数: 0 h-index: 0机构: Osaka Univ, Inst Laser Engn, Osaka, JapanMurakami, M.论文数: 0 引用数: 0 h-index: 0机构: Osaka Univ, Inst Laser Engn, Osaka, JapanSunahara, A.论文数: 0 引用数: 0 h-index: 0机构: Osaka Univ, Inst Laser Engn, Osaka, JapanFurukawa, H.论文数: 0 引用数: 0 h-index: 0机构: Osaka Univ, Inst Laser Engn, Osaka, JapanSasaki, A.论文数: 0 引用数: 0 h-index: 0机构: Osaka Univ, Inst Laser Engn, Osaka, JapanNishikawa, W.论文数: 0 引用数: 0 h-index: 0机构: Osaka Univ, Inst Laser Engn, Osaka, JapanTanuma, H.论文数: 0 引用数: 0 h-index: 0机构: Osaka Univ, Inst Laser Engn, Osaka, JapanNorimatsu, T.论文数: 0 引用数: 0 h-index: 0机构: Osaka Univ, Inst Laser Engn, Osaka, JapanNagai, K.论文数: 0 引用数: 0 h-index: 0机构: Osaka Univ, Inst Laser Engn, Osaka, JapanGu, Q.论文数: 0 引用数: 0 h-index: 0机构: Osaka Univ, Inst Laser Engn, Osaka, JapanNakatsuka, M.论文数: 0 引用数: 0 h-index: 0机构: Osaka Univ, Inst Laser Engn, Osaka, JapanFujita, H.论文数: 0 引用数: 0 h-index: 0机构: Osaka Univ, Inst Laser Engn, Osaka, JapanTsubakimoto, K.论文数: 0 引用数: 0 h-index: 0机构: Osaka Univ, Inst Laser Engn, Osaka, JapanYoshida, H.论文数: 0 引用数: 0 h-index: 0机构: Osaka Univ, Inst Laser Engn, Osaka, JapanMima, K.论文数: 0 引用数: 0 h-index: 0机构: Osaka Univ, Inst Laser Engn, Osaka, Japan
- [4] Laser-imaging of laser-produced tin plume behavior for EUV light source2007 PACIFIC RIM CONFERENCE ON LASERS AND ELECTRO-OPTICS, VOLS 1-4, 2007, : 736 - +Nakamura, Daisuke论文数: 0 引用数: 0 h-index: 0机构: Kyushu Univ, Grad Sch Informat Sci & Elect Engn, 744 Motooka, Fukuoka 8190395, Japan Kyushu Univ, Grad Sch Informat Sci & Elect Engn, 744 Motooka, Fukuoka 8190395, JapanHashimoto, Yuki论文数: 0 引用数: 0 h-index: 0机构: Kyushu Univ, Grad Sch Informat Sci & Elect Engn, 744 Motooka, Fukuoka 8190395, Japan Kyushu Univ, Grad Sch Informat Sci & Elect Engn, 744 Motooka, Fukuoka 8190395, JapanTamaru, Koji论文数: 0 引用数: 0 h-index: 0机构: Kyushu Univ, Grad Sch Informat Sci & Elect Engn, 744 Motooka, Fukuoka 8190395, Japan Kyushu Univ, Grad Sch Informat Sci & Elect Engn, 744 Motooka, Fukuoka 8190395, JapanTakahashi, Akihiko论文数: 0 引用数: 0 h-index: 0机构: Kyushu Univ, Grad Sch Med, Higashi Ku, Fukuoka 8128582, Japan Kyushu Univ, Grad Sch Informat Sci & Elect Engn, 744 Motooka, Fukuoka 8190395, JapanOkada, Tatsuo论文数: 0 引用数: 0 h-index: 0机构: Kyushu Univ, Grad Sch Informat Sci & Elect Engn, 744 Motooka, Fukuoka 8190395, Japan Kyushu Univ, Grad Sch Informat Sci & Elect Engn, 744 Motooka, Fukuoka 8190395, Japan
- [5] Present status of laser-produced plasma EUV light sourceEXTREME ULTRAVIOLET (EUV) LITHOGRAPHY, 2010, 7636Nagano, Hitoshi论文数: 0 引用数: 0 h-index: 0机构: EUVA Komatsu Japan, 1200 Manda, Kanagawa 2548567, Japan EUVA Komatsu Japan, 1200 Manda, Kanagawa 2548567, JapanAbe, Tamotsu论文数: 0 引用数: 0 h-index: 0机构: EUVA Komatsu Japan, 1200 Manda, Kanagawa 2548567, Japan EUVA Komatsu Japan, 1200 Manda, Kanagawa 2548567, JapanNagai, Shinji论文数: 0 引用数: 0 h-index: 0机构: EUVA Komatsu Japan, 1200 Manda, Kanagawa 2548567, Japan EUVA Komatsu Japan, 1200 Manda, Kanagawa 2548567, JapanNakano, Masaki论文数: 0 引用数: 0 h-index: 0机构: EUVA Komatsu Japan, 1200 Manda, Kanagawa 2548567, Japan EUVA Komatsu Japan, 1200 Manda, Kanagawa 2548567, JapanAkanuma, Yoshihiko论文数: 0 引用数: 0 h-index: 0机构: EUVA Komatsu Japan, 1200 Manda, Kanagawa 2548567, Japan EUVA Komatsu Japan, 1200 Manda, Kanagawa 2548567, JapanNakajima, Shin论文数: 0 引用数: 0 h-index: 0机构: EUVA Komatsu Japan, 1200 Manda, Kanagawa 2548567, Japan EUVA Komatsu Japan, 1200 Manda, Kanagawa 2548567, JapanKakizaki, Kouji论文数: 0 引用数: 0 h-index: 0机构: EUVA Komatsu Japan, 1200 Manda, Kanagawa 2548567, Japan EUVA Komatsu Japan, 1200 Manda, Kanagawa 2548567, JapanSumitani, Akira论文数: 0 引用数: 0 h-index: 0机构: EUVA Komatsu Japan, 1200 Manda, Kanagawa 2548567, Japan EUVA Komatsu Japan, 1200 Manda, Kanagawa 2548567, JapanFujimoto, Junichi论文数: 0 引用数: 0 h-index: 0机构: Gigaphoton Japan, Oyama, Tochigi 3238558, Japan EUVA Komatsu Japan, 1200 Manda, Kanagawa 2548567, JapanMizoguchi, Hakaru论文数: 0 引用数: 0 h-index: 0机构: Gigaphoton Japan, Oyama, Tochigi 3238558, Japan EUVA Komatsu Japan, 1200 Manda, Kanagawa 2548567, Japan
- [6] Metrology of laser-produced plasma light source for EUV lithographyMetrology, Inspection, and Process Control for Microlithography XIX, Pts 1-3, 2005, 5752 : 1248 - 1256Böwering, NR论文数: 0 引用数: 0 h-index: 0机构: Cymer Inc, San Diego, CA 92127 USA Cymer Inc, San Diego, CA 92127 USAHoffman, JR论文数: 0 引用数: 0 h-index: 0机构: Cymer Inc, San Diego, CA 92127 USA Cymer Inc, San Diego, CA 92127 USAKhodykin, OV论文数: 0 引用数: 0 h-index: 0机构: Cymer Inc, San Diego, CA 92127 USA Cymer Inc, San Diego, CA 92127 USARettig, CL论文数: 0 引用数: 0 h-index: 0机构: Cymer Inc, San Diego, CA 92127 USA Cymer Inc, San Diego, CA 92127 USAHansson, BAM论文数: 0 引用数: 0 h-index: 0机构: Cymer Inc, San Diego, CA 92127 USA Cymer Inc, San Diego, CA 92127 USAErshov, AI论文数: 0 引用数: 0 h-index: 0机构: Cymer Inc, San Diego, CA 92127 USA Cymer Inc, San Diego, CA 92127 USAFomenkov, IV论文数: 0 引用数: 0 h-index: 0机构: Cymer Inc, San Diego, CA 92127 USA Cymer Inc, San Diego, CA 92127 USA
- [7] Evolution analysis of EUV radiation from laser-produced tin plasmasXXX INTERNATIONAL CONFERENCE ON PHOTONIC, ELECTRONIC, AND ATOMIC COLLISIONS (ICPEAC2017), 2017, 875Su, M. G.论文数: 0 引用数: 0 h-index: 0机构: Northwest Normal Univ, Coll Phys & Elect Engn, Key Lab Atom & Mol Phys & Funct Mat Gansu Prov, Lanzhou 730070, Gansu, Peoples R China Northwest Normal Univ, Coll Phys & Elect Engn, Key Lab Atom & Mol Phys & Funct Mat Gansu Prov, Lanzhou 730070, Gansu, Peoples R ChinaMin, Q.论文数: 0 引用数: 0 h-index: 0机构: Northwest Normal Univ, Coll Phys & Elect Engn, Key Lab Atom & Mol Phys & Funct Mat Gansu Prov, Lanzhou 730070, Gansu, Peoples R China Northwest Normal Univ, Coll Phys & Elect Engn, Key Lab Atom & Mol Phys & Funct Mat Gansu Prov, Lanzhou 730070, Gansu, Peoples R ChinaCao, S. Q.论文数: 0 引用数: 0 h-index: 0机构: Northwest Normal Univ, Coll Phys & Elect Engn, Key Lab Atom & Mol Phys & Funct Mat Gansu Prov, Lanzhou 730070, Gansu, Peoples R China Northwest Normal Univ, Coll Phys & Elect Engn, Key Lab Atom & Mol Phys & Funct Mat Gansu Prov, Lanzhou 730070, Gansu, Peoples R ChinaSun, D. X.论文数: 0 引用数: 0 h-index: 0机构: Northwest Normal Univ, Coll Phys & Elect Engn, Key Lab Atom & Mol Phys & Funct Mat Gansu Prov, Lanzhou 730070, Gansu, Peoples R China Northwest Normal Univ, Coll Phys & Elect Engn, Key Lab Atom & Mol Phys & Funct Mat Gansu Prov, Lanzhou 730070, Gansu, Peoples R China论文数: 引用数: h-index:机构:O'Sullivan, G.论文数: 0 引用数: 0 h-index: 0机构: Univ Coll Dublin, Sch Phys, Dublin, Ireland Northwest Normal Univ, Coll Phys & Elect Engn, Key Lab Atom & Mol Phys & Funct Mat Gansu Prov, Lanzhou 730070, Gansu, Peoples R ChinaDong, C. Z.论文数: 0 引用数: 0 h-index: 0机构: Northwest Normal Univ, Coll Phys & Elect Engn, Key Lab Atom & Mol Phys & Funct Mat Gansu Prov, Lanzhou 730070, Gansu, Peoples R China Northwest Normal Univ, Coll Phys & Elect Engn, Key Lab Atom & Mol Phys & Funct Mat Gansu Prov, Lanzhou 730070, Gansu, Peoples R China
- [8] Investigation of debris dynamics from laser-produced tin plasma for EUV lithography light sourceApplied Physics A, 2008, 92 : 767 - 772D. Nakamura论文数: 0 引用数: 0 h-index: 0机构: Kyushu University,Graduate School of Information Science and Electrical EngineeringK. Tamaru论文数: 0 引用数: 0 h-index: 0机构: Kyushu University,Graduate School of Information Science and Electrical EngineeringT. Akiyama论文数: 0 引用数: 0 h-index: 0机构: Kyushu University,Graduate School of Information Science and Electrical EngineeringA. Takahashi论文数: 0 引用数: 0 h-index: 0机构: Kyushu University,Graduate School of Information Science and Electrical EngineeringT. Okada论文数: 0 引用数: 0 h-index: 0机构: Kyushu University,Graduate School of Information Science and Electrical Engineering
- [9] Investigation of debris dynamics from laser-produced tin plasma for EUV lithography light sourceAPPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 2008, 92 (04): : 767 - 772Nakamura, D.论文数: 0 引用数: 0 h-index: 0机构: Kyushu Univ, Grad Sch Informat Sci & Elect Engn, Nishi Ku, Fukuoka 8190395, Japan Kyushu Univ, Grad Sch Informat Sci & Elect Engn, Nishi Ku, Fukuoka 8190395, JapanTamaru, K.论文数: 0 引用数: 0 h-index: 0机构: Kyushu Univ, Grad Sch Informat Sci & Elect Engn, Nishi Ku, Fukuoka 8190395, Japan Kyushu Univ, Grad Sch Informat Sci & Elect Engn, Nishi Ku, Fukuoka 8190395, JapanAkiyama, T.论文数: 0 引用数: 0 h-index: 0机构: Kyushu Univ, Grad Sch Informat Sci & Elect Engn, Nishi Ku, Fukuoka 8190395, Japan Kyushu Univ, Grad Sch Informat Sci & Elect Engn, Nishi Ku, Fukuoka 8190395, JapanTakahashi, A.论文数: 0 引用数: 0 h-index: 0机构: Kyushu Univ, Sch Med, Higashi Ku, Fukuoka 8128582, Japan Kyushu Univ, Grad Sch Informat Sci & Elect Engn, Nishi Ku, Fukuoka 8190395, JapanOkada, T.论文数: 0 引用数: 0 h-index: 0机构: Kyushu Univ, Grad Sch Informat Sci & Elect Engn, Nishi Ku, Fukuoka 8190395, Japan Kyushu Univ, Grad Sch Informat Sci & Elect Engn, Nishi Ku, Fukuoka 8190395, Japan
- [10] Temporal pre-pulse shaping in dual pulse laser produced plasma for the optimization of the EUV source in tin microdroplet systemJOURNAL OF APPLIED PHYSICS, 2024, 135 (09)Sizyuk, V.论文数: 0 引用数: 0 h-index: 0机构: Purdue Univ, Ctr Mat Extreme Environm CMUXE, W Lafayette, IN 47907 USA Purdue Univ, Ctr Mat Extreme Environm CMUXE, W Lafayette, IN 47907 USASizyuk, T.论文数: 0 引用数: 0 h-index: 0机构: Argonne Natl Lab, Lemont, IL 60439 USA Purdue Univ, Ctr Mat Extreme Environm CMUXE, W Lafayette, IN 47907 USA论文数: 引用数: h-index:机构: