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- [11] Imaging Diagnostics of Debris from Laser-Produced Tin Plasma with Droplet Target for EUV Light SourceJOURNAL OF LASER MICRO NANOENGINEERING, 2008, 3 (03): : 196 - 200Nakamura, Daisuke论文数: 0 引用数: 0 h-index: 0机构: Kyushu Univ, Grad Sch Informat Sci & Elect Engn, Nishi Ku, Fukuoka 8190395, Japan Kyushu Univ, Grad Sch Informat Sci & Elect Engn, Nishi Ku, Fukuoka 8190395, JapanAkiyama, Tomoya论文数: 0 引用数: 0 h-index: 0机构: Kyushu Univ, Grad Sch Informat Sci & Elect Engn, Nishi Ku, Fukuoka 8190395, Japan Kyushu Univ, Grad Sch Informat Sci & Elect Engn, Nishi Ku, Fukuoka 8190395, JapanTakahashi, Akihiko论文数: 0 引用数: 0 h-index: 0机构: Kyushu Univ, Grad Sch Med Sci, Higashi Ku, Fukuoka 8128582, Japan Kyushu Univ, Grad Sch Informat Sci & Elect Engn, Nishi Ku, Fukuoka 8190395, JapanOkada, Tatsuo论文数: 0 引用数: 0 h-index: 0机构: Kyushu Univ, Grad Sch Informat Sci & Elect Engn, Nishi Ku, Fukuoka 8190395, Japan Kyushu Univ, Grad Sch Informat Sci & Elect Engn, Nishi Ku, Fukuoka 8190395, Japan
- [12] Laser-produced plasma EUV source based on tin-rich, thin-layer targetsApplied Physics B, 2011, 102 : 559 - 567R. Rakowski论文数: 0 引用数: 0 h-index: 0机构: Military University of Technology,Institute of OptoelectronicsJ. Mikołajczyk论文数: 0 引用数: 0 h-index: 0机构: Military University of Technology,Institute of OptoelectronicsA. Bartnik论文数: 0 引用数: 0 h-index: 0机构: Military University of Technology,Institute of OptoelectronicsH. Fiedorowicz论文数: 0 引用数: 0 h-index: 0机构: Military University of Technology,Institute of OptoelectronicsF. de Gaufridy de Dortan论文数: 0 引用数: 0 h-index: 0机构: Military University of Technology,Institute of OptoelectronicsR. Jarocki论文数: 0 引用数: 0 h-index: 0机构: Military University of Technology,Institute of OptoelectronicsJ. Kostecki论文数: 0 引用数: 0 h-index: 0机构: Military University of Technology,Institute of OptoelectronicsM. Szczurek论文数: 0 引用数: 0 h-index: 0机构: Military University of Technology,Institute of OptoelectronicsP. Wachulak论文数: 0 引用数: 0 h-index: 0机构: Military University of Technology,Institute of Optoelectronics
- [13] PREUVE and the EXULITE project:: Modular laser-produced plasma EUV sourceHIGH-POWER LASER ABLATION IV, PTS 1 AND 2, 2002, 4760 : 447 - 453Ceccotti, T论文数: 0 引用数: 0 h-index: 0机构: CEA Saclay, Grp Applicat Plasmas, DSM DRECAM SPAM, F-91191 Gif Sur Yvette, France CEA Saclay, Grp Applicat Plasmas, DSM DRECAM SPAM, F-91191 Gif Sur Yvette, FranceChichmanian, F论文数: 0 引用数: 0 h-index: 0机构: CEA Saclay, Grp Applicat Plasmas, DSM DRECAM SPAM, F-91191 Gif Sur Yvette, France CEA Saclay, Grp Applicat Plasmas, DSM DRECAM SPAM, F-91191 Gif Sur Yvette, FranceDescamps, D论文数: 0 引用数: 0 h-index: 0机构: CEA Saclay, Grp Applicat Plasmas, DSM DRECAM SPAM, F-91191 Gif Sur Yvette, France CEA Saclay, Grp Applicat Plasmas, DSM DRECAM SPAM, F-91191 Gif Sur Yvette, FranceHaltebourg, P论文数: 0 引用数: 0 h-index: 0机构: CEA Saclay, Grp Applicat Plasmas, DSM DRECAM SPAM, F-91191 Gif Sur Yvette, France CEA Saclay, Grp Applicat Plasmas, DSM DRECAM SPAM, F-91191 Gif Sur Yvette, FranceHergott, JF论文数: 0 引用数: 0 h-index: 0机构: CEA Saclay, Grp Applicat Plasmas, DSM DRECAM SPAM, F-91191 Gif Sur Yvette, France CEA Saclay, Grp Applicat Plasmas, DSM DRECAM SPAM, F-91191 Gif Sur Yvette, FranceHulin, S论文数: 0 引用数: 0 h-index: 0机构: CEA Saclay, Grp Applicat Plasmas, DSM DRECAM SPAM, F-91191 Gif Sur Yvette, France CEA Saclay, Grp Applicat Plasmas, DSM DRECAM SPAM, F-91191 Gif Sur Yvette, FranceNormand, D论文数: 0 引用数: 0 h-index: 0机构: CEA Saclay, Grp Applicat Plasmas, DSM DRECAM SPAM, F-91191 Gif Sur Yvette, France CEA Saclay, Grp Applicat Plasmas, DSM DRECAM SPAM, F-91191 Gif Sur Yvette, FranceSegers, M论文数: 0 引用数: 0 h-index: 0机构: CEA Saclay, Grp Applicat Plasmas, DSM DRECAM SPAM, F-91191 Gif Sur Yvette, France CEA Saclay, Grp Applicat Plasmas, DSM DRECAM SPAM, F-91191 Gif Sur Yvette, FranceSublemontier, O论文数: 0 引用数: 0 h-index: 0机构: CEA Saclay, Grp Applicat Plasmas, DSM DRECAM SPAM, F-91191 Gif Sur Yvette, France CEA Saclay, Grp Applicat Plasmas, DSM DRECAM SPAM, F-91191 Gif Sur Yvette, FranceSchmidt, M论文数: 0 引用数: 0 h-index: 0机构: CEA Saclay, Grp Applicat Plasmas, DSM DRECAM SPAM, F-91191 Gif Sur Yvette, France CEA Saclay, Grp Applicat Plasmas, DSM DRECAM SPAM, F-91191 Gif Sur Yvette, FranceCormont, P论文数: 0 引用数: 0 h-index: 0机构: CEA Saclay, Grp Applicat Plasmas, DSM DRECAM SPAM, F-91191 Gif Sur Yvette, France CEA Saclay, Grp Applicat Plasmas, DSM DRECAM SPAM, F-91191 Gif Sur Yvette, FranceNeu, M论文数: 0 引用数: 0 h-index: 0机构: CEA Saclay, Grp Applicat Plasmas, DSM DRECAM SPAM, F-91191 Gif Sur Yvette, France CEA Saclay, Grp Applicat Plasmas, DSM DRECAM SPAM, F-91191 Gif Sur Yvette, FranceThro, PY论文数: 0 引用数: 0 h-index: 0机构: CEA Saclay, Grp Applicat Plasmas, DSM DRECAM SPAM, F-91191 Gif Sur Yvette, France CEA Saclay, Grp Applicat Plasmas, DSM DRECAM SPAM, F-91191 Gif Sur Yvette, FranceWeulersse, JM论文数: 0 引用数: 0 h-index: 0机构: CEA Saclay, Grp Applicat Plasmas, DSM DRECAM SPAM, F-91191 Gif Sur Yvette, France CEA Saclay, Grp Applicat Plasmas, DSM DRECAM SPAM, F-91191 Gif Sur Yvette, FranceBarthod, B论文数: 0 引用数: 0 h-index: 0机构: CEA Saclay, Grp Applicat Plasmas, DSM DRECAM SPAM, F-91191 Gif Sur Yvette, France CEA Saclay, Grp Applicat Plasmas, DSM DRECAM SPAM, F-91191 Gif Sur Yvette, FranceBernard, R论文数: 0 引用数: 0 h-index: 0机构: CEA Saclay, Grp Applicat Plasmas, DSM DRECAM SPAM, F-91191 Gif Sur Yvette, France CEA Saclay, Grp Applicat Plasmas, DSM DRECAM SPAM, F-91191 Gif Sur Yvette, FranceVéran, E论文数: 0 引用数: 0 h-index: 0机构: CEA Saclay, Grp Applicat Plasmas, DSM DRECAM SPAM, F-91191 Gif Sur Yvette, France CEA Saclay, Grp Applicat Plasmas, DSM DRECAM SPAM, F-91191 Gif Sur Yvette, FranceBarbiche, JM论文数: 0 引用数: 0 h-index: 0机构: CEA Saclay, Grp Applicat Plasmas, DSM DRECAM SPAM, F-91191 Gif Sur Yvette, France CEA Saclay, Grp Applicat Plasmas, DSM DRECAM SPAM, F-91191 Gif Sur Yvette, FranceD'Aux, P论文数: 0 引用数: 0 h-index: 0机构: CEA Saclay, Grp Applicat Plasmas, DSM DRECAM SPAM, F-91191 Gif Sur Yvette, France CEA Saclay, Grp Applicat Plasmas, DSM DRECAM SPAM, F-91191 Gif Sur Yvette, FranceMarquis, E论文数: 0 引用数: 0 h-index: 0机构: CEA Saclay, Grp Applicat Plasmas, DSM DRECAM SPAM, F-91191 Gif Sur Yvette, France CEA Saclay, Grp Applicat Plasmas, DSM DRECAM SPAM, F-91191 Gif Sur Yvette, France
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- [15] Tin based laser-produced plasma source development for EUVLMICROELECTRONIC ENGINEERING, 2006, 83 (4-9) : 699 - 702Hayden, P.论文数: 0 引用数: 0 h-index: 0机构: Natl Univ Ireland Univ Coll Dublin, Sch Phys, Dublin 4, Ireland Natl Univ Ireland Univ Coll Dublin, Sch Phys, Dublin 4, IrelandWhite, J.论文数: 0 引用数: 0 h-index: 0机构: Natl Univ Ireland Univ Coll Dublin, Sch Phys, Dublin 4, Ireland Natl Univ Ireland Univ Coll Dublin, Sch Phys, Dublin 4, IrelandCummings, A.论文数: 0 引用数: 0 h-index: 0机构: Natl Univ Ireland Univ Coll Dublin, Sch Phys, Dublin 4, Ireland Natl Univ Ireland Univ Coll Dublin, Sch Phys, Dublin 4, IrelandDunne, P.论文数: 0 引用数: 0 h-index: 0机构: Natl Univ Ireland Univ Coll Dublin, Sch Phys, Dublin 4, Ireland Natl Univ Ireland Univ Coll Dublin, Sch Phys, Dublin 4, IrelandLysaght, M.论文数: 0 引用数: 0 h-index: 0机构: Natl Univ Ireland Univ Coll Dublin, Sch Phys, Dublin 4, Ireland Natl Univ Ireland Univ Coll Dublin, Sch Phys, Dublin 4, IrelandMurphy, N.论文数: 0 引用数: 0 h-index: 0机构: Natl Univ Ireland Univ Coll Dublin, Sch Phys, Dublin 4, Ireland Natl Univ Ireland Univ Coll Dublin, Sch Phys, Dublin 4, IrelandSheridan, P.论文数: 0 引用数: 0 h-index: 0机构: Natl Univ Ireland Univ Coll Dublin, Sch Phys, Dublin 4, Ireland Natl Univ Ireland Univ Coll Dublin, Sch Phys, Dublin 4, IrelandO'Sullivan, G.论文数: 0 引用数: 0 h-index: 0机构: Natl Univ Ireland Univ Coll Dublin, Sch Phys, Dublin 4, Ireland Natl Univ Ireland Univ Coll Dublin, Sch Phys, Dublin 4, Ireland
- [16] High power short pulse laser modules for laser produced plasma EUV sourceEMERGING LITHOGRAPHIC TECHNOLOGIES VIII, 2004, 5374 : 145 - 151Ellwi, S论文数: 0 引用数: 0 h-index: 0机构: Powerlase Ltd, Crawley RH10 9RA, W Sussex, England Powerlase Ltd, Crawley RH10 9RA, W Sussex, EnglandComley, A论文数: 0 引用数: 0 h-index: 0机构: Powerlase Ltd, Crawley RH10 9RA, W Sussex, England Powerlase Ltd, Crawley RH10 9RA, W Sussex, EnglandHay, N论文数: 0 引用数: 0 h-index: 0机构: Powerlase Ltd, Crawley RH10 9RA, W Sussex, England Powerlase Ltd, Crawley RH10 9RA, W Sussex, EnglandBrownell, M论文数: 0 引用数: 0 h-index: 0机构: Powerlase Ltd, Crawley RH10 9RA, W Sussex, England Powerlase Ltd, Crawley RH10 9RA, W Sussex, England
- [17] Performance of kilowatt-class laser modules in scaling up laser produced plasma (LPP) EUV sourceEmerging Lithographic Technologies IX, Pts 1 and 2, 2005, 5751 : 272 - 278Ellwi, S论文数: 0 引用数: 0 h-index: 0机构: Powerlase Ltd, Crawley RH10 9RA, W Sussex, England Powerlase Ltd, Crawley RH10 9RA, W Sussex, EnglandComley, A论文数: 0 引用数: 0 h-index: 0机构: Powerlase Ltd, Crawley RH10 9RA, W Sussex, England Powerlase Ltd, Crawley RH10 9RA, W Sussex, EnglandHay, N论文数: 0 引用数: 0 h-index: 0机构: Powerlase Ltd, Crawley RH10 9RA, W Sussex, England Powerlase Ltd, Crawley RH10 9RA, W Sussex, EnglandHenderson, I论文数: 0 引用数: 0 h-index: 0机构: Powerlase Ltd, Crawley RH10 9RA, W Sussex, England Powerlase Ltd, Crawley RH10 9RA, W Sussex, EnglandBrownell, M论文数: 0 引用数: 0 h-index: 0机构: Powerlase Ltd, Crawley RH10 9RA, W Sussex, England Powerlase Ltd, Crawley RH10 9RA, W Sussex, England
- [18] Development of laser-produced plasma based EUV light source technology for HVM EUV lithographyEXTREME ULTRAVIOLET (EUV) LITHOGRAPHY III, 2012, 8322Fujimoto, Junichi论文数: 0 引用数: 0 h-index: 0机构: Gigaphoton Inc, 400 Yokokurashinden, Oyama, Tochigi 3238558, Japan Gigaphoton Inc, 400 Yokokurashinden, Oyama, Tochigi 3238558, JapanHori, Tsukasa论文数: 0 引用数: 0 h-index: 0机构: KOMATSU Ltd, Hiratsuka, Kanagawa 2548555, Japan Gigaphoton Inc, 400 Yokokurashinden, Oyama, Tochigi 3238558, JapanYanagida, Tatsuya论文数: 0 引用数: 0 h-index: 0机构: KOMATSU Ltd, Hiratsuka, Kanagawa 2548555, Japan Gigaphoton Inc, 400 Yokokurashinden, Oyama, Tochigi 3238558, JapanOhta, Takeshi论文数: 0 引用数: 0 h-index: 0机构: KOMATSU Ltd, Hiratsuka, Kanagawa 2548555, Japan Gigaphoton Inc, 400 Yokokurashinden, Oyama, Tochigi 3238558, JapanKawasuji, Yasufumi论文数: 0 引用数: 0 h-index: 0机构: KOMATSU Ltd, Hiratsuka, Kanagawa 2548555, Japan Gigaphoton Inc, 400 Yokokurashinden, Oyama, Tochigi 3238558, JapanShiraishi, Yutaka论文数: 0 引用数: 0 h-index: 0机构: KOMATSU Ltd, Hiratsuka, Kanagawa 2548555, Japan Gigaphoton Inc, 400 Yokokurashinden, Oyama, Tochigi 3238558, JapanAbe, Tamotsu论文数: 0 引用数: 0 h-index: 0机构: KOMATSU Ltd, Hiratsuka, Kanagawa 2548555, Japan Gigaphoton Inc, 400 Yokokurashinden, Oyama, Tochigi 3238558, JapanKodama, Takeshi论文数: 0 引用数: 0 h-index: 0机构: KOMATSU Ltd, Hiratsuka, Kanagawa 2548555, Japan Gigaphoton Inc, 400 Yokokurashinden, Oyama, Tochigi 3238558, JapanNakarai, Hiroaki论文数: 0 引用数: 0 h-index: 0机构: KOMATSU Ltd, Hiratsuka, Kanagawa 2548555, Japan Gigaphoton Inc, 400 Yokokurashinden, Oyama, Tochigi 3238558, JapanYamazaki, Taku论文数: 0 引用数: 0 h-index: 0机构: KOMATSU Ltd, Hiratsuka, Kanagawa 2548555, Japan Gigaphoton Inc, 400 Yokokurashinden, Oyama, Tochigi 3238558, JapanMizoguchi, Hakaru论文数: 0 引用数: 0 h-index: 0机构: Gigaphoton Inc, 400 Yokokurashinden, Oyama, Tochigi 3238558, Japan Gigaphoton Inc, 400 Yokokurashinden, Oyama, Tochigi 3238558, Japan
- [19] Debris characteristics of a laser-produced tin plasma for extreme ultraviolet sourceREVIEW OF SCIENTIFIC INSTRUMENTS, 2005, 76 (12): : 1 - 3Higashiguchi, T论文数: 0 引用数: 0 h-index: 0机构: Miyazaki Univ, Dept Elect & Elect Engn, Miyazaki 8892192, JapanRajyaguru, C论文数: 0 引用数: 0 h-index: 0机构: Miyazaki Univ, Dept Elect & Elect Engn, Miyazaki 8892192, JapanDojyo, N论文数: 0 引用数: 0 h-index: 0机构: Miyazaki Univ, Dept Elect & Elect Engn, Miyazaki 8892192, JapanTaniguchi, Y论文数: 0 引用数: 0 h-index: 0机构: Miyazaki Univ, Dept Elect & Elect Engn, Miyazaki 8892192, JapanSakita, K论文数: 0 引用数: 0 h-index: 0机构: Miyazaki Univ, Dept Elect & Elect Engn, Miyazaki 8892192, JapanKubodera, S论文数: 0 引用数: 0 h-index: 0机构: Miyazaki Univ, Dept Elect & Elect Engn, Miyazaki 8892192, JapanSasaki, W论文数: 0 引用数: 0 h-index: 0机构: Miyazaki Univ, Dept Elect & Elect Engn, Miyazaki 8892192, Japan
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