Interaction between SiO2 and a KF-KCl-K2SiF6 Melt

被引：48
|
作者：
Zaykov, Yurii P. [1 ]
Isakov, Andrey V. [1 ]
Zakiryanova, Irina D. [1 ]
Reznitskikh, Olga G. [1 ]
Chemezov, Oleg V. [1 ]
Redkin, Alexander A. [1 ]
机构：
[1] Russian Acad Sci, Ural Branch, Inst High Temp Electrochem, Ekaterinburg 620990, Russia
来源：
JOURNAL OF PHYSICAL CHEMISTRY B | 2014年 / 118卷 / 06期
关键词：
SILICA; FLUORINE;
D O I：
10.1021/jp4086816
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
The solubility mechanism of silica in a fluoride chloride melt has been determined in situ using Raman spectroscopy. The spectroscopy data revealed that the silica solubility process involved Si-O bond breakage and Si-F bond formation. The process results in the formation of silicate complexes, fluorine-bearing silicate complexes, and silicon tetrafluoride in the melt. Mass spectrometry of the vapor phase over the KF-KCl-K2SiF6 and KF-KCl-K2SiF6-SiO2 melts and differential scanning calorimetry coupled with thermal gravimetric analysis of these melts were performed to verify the silica solubility mechanism.
引用
收藏
页码：1584 / 1588
页数：5
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