Interaction between SiO2 and a KF-KCl-K2SiF6 Melt

被引：48
|
作者：
Zaykov, Yurii P. [1 ]
Isakov, Andrey V. [1 ]
Zakiryanova, Irina D. [1 ]
Reznitskikh, Olga G. [1 ]
Chemezov, Oleg V. [1 ]
Redkin, Alexander A. [1 ]
机构：
[1] Russian Acad Sci, Ural Branch, Inst High Temp Electrochem, Ekaterinburg 620990, Russia
来源：
JOURNAL OF PHYSICAL CHEMISTRY B | 2014年 / 118卷 / 06期
关键词：
SILICA; FLUORINE;
D O I：
10.1021/jp4086816
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
The solubility mechanism of silica in a fluoride chloride melt has been determined in situ using Raman spectroscopy. The spectroscopy data revealed that the silica solubility process involved Si-O bond breakage and Si-F bond formation. The process results in the formation of silicate complexes, fluorine-bearing silicate complexes, and silicon tetrafluoride in the melt. Mass spectrometry of the vapor phase over the KF-KCl-K2SiF6 and KF-KCl-K2SiF6-SiO2 melts and differential scanning calorimetry coupled with thermal gravimetric analysis of these melts were performed to verify the silica solubility mechanism.
引用
收藏
页码：1584 / 1588
页数：5
相关论文
共 50 条
  • [21] STUDIES IN THE COMPOSITION OF ANODE PRODUCTS OF THE KCL-KF-K2SIF6 MELT ELECTROLYSIS BY THE GAS-CHROMATOGRAPHY METHOD
    ANDRIYKO, AA
    DELIMARSKY, YK
    CHERNOV, RV
    UKRAINSKII KHIMICHESKII ZHURNAL, 1984, 50 (11): : 1175 - 1180
  • [22] Electrodeposition of Silicon from the KCl–CsCl–K2SiF6 Melt
    T. A. Gevel
    S. I. Zhuk
    N. M. Leonova
    A. M. Leonova
    A. V. Suzdal’tsev
    Yu. P. Zaikov
    Russian Metallurgy (Metally), 2022, 2022 : 958 - 964
  • [23] Electrodeposition of Silicon from the KCl-CsCl-K2SiF6 Melt
    Gevel, T. A.
    Zhuk, S., I
    Leonova, N. M.
    Leonova, A. M.
    Suzdal'tsev, A., V
    Zaikov, Yu P.
    RUSSIAN METALLURGY, 2022, 2022 (08): : 958 - 964
  • [24] Electrodeposition of aluminum-doped thin silicon films from a KF-KCl-KI-K2SiF6-AlF3 melt
    Laptev, Michael, V
    Khudorozhkova, Anastasia O.
    Isakov, Andrey, V
    Grishenkova, Olga, V
    Zhuk, Sergey, I
    Zaikov, Yurii P.
    JOURNAL OF THE SERBIAN CHEMICAL SOCIETY, 2021, 86 (11) : 1075 - 1087
  • [25] K2SiF6容量法测定SiO2的操作
    吴英德
    四川水泥, 2005, (02) : 46 - 47
  • [26] Study of the Silicon Electrochemical Nucleation in LiCl-KCl-CsCl-K2SiF6 Melt
    Parasotchenko, Yu.
    Suzdaltsev, A.
    Pavlenko, O.
    Zaykov, Yu.
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2023, 170 (02)
  • [27] K2SiF6容量法快速测定水泥中SiO2
    王士龙，郑礼胜，张虹
    水泥, 1996, (07) : 36 - 37
  • [28] K2SiF6容量法测定SiO2的注意事项
    刘文长
    张丽军
    水泥, 2011, (05) : 57 - 59
  • [29] K2SiF6容量法测定SiO2有关问题的探讨
    薛谆
    车万里
    广东建材, 1994, (05) : 32 - 32
  • [30] Study into the possibility of silicon electrodeposition from a low-fluoride KCl-K2SiF6 melt
    Timofey Gevel
    Sergey Zhuk
    Andrey Suzdaltsev
    Yuriy Zaikov
    Ionics, 2022, 28 : 3537 - 3545
12345