Interaction between SiO2 and a KF-KCl-K2SiF6 Melt

被引：48
|
作者：
Zaykov, Yurii P. [1 ]
Isakov, Andrey V. [1 ]
Zakiryanova, Irina D. [1 ]
Reznitskikh, Olga G. [1 ]
Chemezov, Oleg V. [1 ]
Redkin, Alexander A. [1 ]
机构：
[1] Russian Acad Sci, Ural Branch, Inst High Temp Electrochem, Ekaterinburg 620990, Russia
来源：
JOURNAL OF PHYSICAL CHEMISTRY B | 2014年 / 118卷 / 06期
关键词：
SILICA; FLUORINE;
D O I：
10.1021/jp4086816
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
The solubility mechanism of silica in a fluoride chloride melt has been determined in situ using Raman spectroscopy. The spectroscopy data revealed that the silica solubility process involved Si-O bond breakage and Si-F bond formation. The process results in the formation of silicate complexes, fluorine-bearing silicate complexes, and silicon tetrafluoride in the melt. Mass spectrometry of the vapor phase over the KF-KCl-K2SiF6 and KF-KCl-K2SiF6-SiO2 melts and differential scanning calorimetry coupled with thermal gravimetric analysis of these melts were performed to verify the silica solubility mechanism.
引用
收藏
页码：1584 / 1588
页数：5
相关论文
共 50 条
  • [1] Electrochemical nucleation and growth of silicon in the KF-KCl-K2SiF6 melt
    Zaykov, Yurii P.
    Zhuk, Sergey I.
    Isakov, Andrey V.
    Grishenkova, Olga V.
    Isaev, Vladimir A.
    JOURNAL OF SOLID STATE ELECTROCHEMISTRY, 2015, 19 (05) : 1341 - 1345
  • [2] Electrochemical nucleation and growth of silicon in the KF-KCl-K2SiF6 melt
    Yurii P. Zaykov
    Sergey I. Zhuk
    Andrey V. Isakov
    Olga V. Grishenkova
    Vladimir A. Isaev
    Journal of Solid State Electrochemistry, 2015, 19 : 1341 - 1345
  • [3] THE DIAGRAM OF KF-KCL-K2SIF6 FUSIBILITY
    BOIKO, OI
    CHERNOV, RV
    UKRAINSKII KHIMICHESKII ZHURNAL, 1983, 49 (05): : 548 - 551
  • [4] DFT-based calculations of silicon complex structures in KF-KCl-K2SiF6 and KF-KCl-K2SiF6-SiO2 melts
    Vorob'ev, Alexey S.
    Isakov, Andrey, V
    Galashev, Alexander Y.
    Zaikov, Yuri P.
    JOURNAL OF THE SERBIAN CHEMICAL SOCIETY, 2019, 84 (10) : 1129 - 1142
  • [5] Electrodeposition of Continuous Silicon Coatings from the KF-KCl-K2SiF6 Melts
    Zhuk, Sergey I.
    Isakov, Andrey V.
    Apisarov, Alexey P.
    Grishenkova, Olga V.
    Isaev, Vladimir A.
    Vovkotrub, Emma G.
    Zaykov, Yurii P.
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2017, 164 (08) : H5135 - H5138
  • [6] Influence of KI on the Reactions in the KF–KCl Systems Containing K2SiF6 and SiO2
    A. V. Isakov
    A. O. Khudorozhkova
    E. G. Vovkotrub
    A. S. Vorob’ev
    A. A. Red’kin
    Yu. P. Zaikov
    Russian Metallurgy (Metally), 2021, 2021 : 937 - 945
  • [7] Rheological and thermal properties of the KF-KCl-K2SiF6 electrolyte for electrolytic production of silicon
    Isakov, Andrey
    Khudorozhkova, Anastasia
    Redkin, Alexander
    Zaikov, Yurii
    JOURNAL OF RHEOLOGY, 2021, 65 (02) : 171 - 177
  • [8] Calculations of Silicon Complexes in KF-KCl-KI-K2SiF6 and KF-KCl-KI-K2SiF6-SiO2 Molten Electrolytes
    Vorob'ev, A. S.
    Isakov, A., V
    Kazakovtseva, N. A.
    Khudorozhkova, A. O.
    Galashev, A. E.
    Zaikov, Yu P.
    PHYSICS, TECHNOLOGIES AND INNOVATION (PTI-2019), 2019, 2174
  • [9] Electrodeposition of Crystalline Si Using a Liquid Ga Electrode in Molten KF-KCl-K2SiF6
    Moteki, Wataru
    Norikawa, Yutaro
    Nohira, Toshiyuki
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2024, 171 (08)
  • [10] Silicon Electrodeposition in the KCl-K2SiF6-SiO2 Melt
    Gevel, T. A.
    Gorshkov, L. V.
    Suzdal'tsev, A. V.
    Zaikov, Yu. P.
    RUSSIAN METALLURGY, 2024, 2024 (04): : 805 - 810
12345