Low-Leakage Power-Rail ESD Clamp Circuit With Gated Current Mirror in a 65-nm CMOS Technology

被引：0

作者：

Aliolaguirre, Federico A. ^{[1
]}

Keri, Ming-Dou ^{[1
]}

机构：

[1] Natl Chiao Tung Univ, Insitute Elect, Hsinchu, Taiwan

来源：

2013 IEEE INTERNATIONAL SYMPOSIUM ON CIRCUITS AND SYSTEMS (ISCAS) | 2013年

关键词：

PROTECTION DESIGN;

D O I：

暂无

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

A new power-rail ESD clamp circuit is proposed and verified with consideration of the gate leakage issue in 65-nm CMOS technology. The proposed circuit can reduce the total leakage current of the traditional power-rail ESD clamp circuit in two orders of magnitude. Moreover, the proposed circuit reduces the required silicon area by boosting the capacitor with a current mirror. The measured leakage current of the proposed powerrail ESD clamp circuit is 220nA (VDD = 1V, T= 25 degrees C), much lower than the 20.55 mu A of the traditional design. In addition, the required area for the proposed design is 50 mu m x 30 mu m, which is a 40% reduction in silicon area to the traditional one, that can sustain the HBM (MM) ESD stress of 3.5kV (250V).

引用

页码：2638 / 2641

页数：4

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