Effect of oxide/oxide interface on polarity dependent resistive switching behavior in ZnO/ZrO2 heterostructures

被引:52
|
作者
Xu, Zedong [1 ]
Yu, Lina [1 ]
Xu, Xiaoguang [1 ]
Miao, Jun [1 ]
Jiang, Yong [1 ]
机构
[1] Univ Sci & Technol Beijing, Sch Mat Sci & Engn, State Key Lab Adv Met & Mat, Beijing 100083, Peoples R China
基金
美国国家科学基金会;
关键词
MEMORY; DEVICE; DENSITY; FILMS;
D O I
10.1063/1.4878402
中图分类号
O59 [应用物理学];
学科分类号
摘要
The effect of oxide/oxide interface for controlling the migration process of oxygen vacancies (or oxygen ions) on resistive switching behaviors has been investigated by fabricating the ZrO2/ZnO oxide heterostructures. Completely different resistive switching behaviors are observed in the heterostructures with a set process under a different bias polarity. It is demonstrated that the change of the oxide/oxide interface barrier height determining the migration of oxygen vacancies (or oxygen ions) leads to the current direction-dependent resistive switching. Furthermore, the ZnO/ZrO2 heterostructure with the homogeneous resistive switching behavior could be potentially applied as a controllable and stable multistate memory by controlling reset-stop voltages. Our method opens up an opportunity to explore the resistive switching mechanism and develop resistance switching devices with specific functions through engineering oxide/oxide interfaces in oxide heterostructures. (C) 2014 AIP Publishing LLC.
引用
收藏
页数:5
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