Photo-catalytic Activity of Cu2O Films with Various Crystal Structures Prepared by DC Reactive Magnetron Sputtering

被引：4
|
作者：
Zhu, Hailing [1 ]
Zhang, Junying [1 ]
Lan, Xiang [1 ]
Li, Chunzhi [1 ]
Wang, Tianmin [1 ]
Huang, Baibiao [2 ]
机构：
[1] Beihang Univ, Sch Sci, Beijing 100083, Peoples R China
[2] Shandong Univ, State Key Lab Crystal Mat, Jinan 250100, Peoples R China
来源：
MATERIALS RESEARCH, PTS 1 AND 2 | 2009年 / 610-613卷
关键词：
Photo-catalytic activity; DC reactive magnetron sputtering; Oxygen flow rate; Sputtering power; Sputtering pressure; Cu2O film; THIN-FILMS; CUO;
D O I：
10.4028/www.scientific.net/MSF.610-613.293
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
The direct current (DC) reactive magnetron sputtering of a metal copper target in oxygen-argon mixed atmospheres to produce thin films of crystalline copper oxides was described. The sputtering pressure, Sputtering power and oxygen flow rate were established in order to control ;the structures and properties of Cu2O films. The as-deposited Cu2O films with various crystal structures have high visible absorption and photo-catalytic activity under visible light irradiation. The photo-catalytic properties Of Cu2O films are affected by not only the crystal Structure but also the surface morphology.
引用
收藏
页码：293 / 298
页数：6
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