Plasma Polymer Thin Films with Controlled Topography and Chemistry at the Nanoscale

被引：2

作者：

Soppera, Olivier ^{[1
]}

Dirani, Ali ^{[1
]}

Roucoules, Vincent ^{[2
]}

Ponche, Arnaud ^{[2
]}

机构：

[1] Univ Haute Alsace, Dept Photochim Gen, CNRS, FRE 3252, F-68058 Mulhouse, France

[2] Univ Haute Alsace, Inst Mat Sci Mulhouse IS2M, CNRS, LRC 7228, F-68058 Mulhouse, France

来源：

JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY | 2009年 / 22卷 / 02期

关键词：

DUV lithography; plasma polymer; nanopatterning;

D O I：

10.2494/photopolymer.22.249

中图分类号：

O63 [高分子化学（高聚物）];

学科分类号：

070305 ; 080501 ; 081704 ;

摘要：

We describe here a new method for fabrication of chemical and topographical functional materials on the micrometer and on the nanometer scale. This technique entails the deposition of polymer thin films by pulsed plasma polymerization. Nanopatterning is achieved by means of DUV interferometry at 193 nm. Using this approach, it is possible to generate multi-scale topographical or chemical images and create combinatorial patterned surfaces. This procedure opens a door to the control of both chemistry and topography on polymer films at different scales ranging from nano to macro.

引用

页码：249 / 251

页数：3

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