Plasma Polymer Thin Films with Controlled Topography and Chemistry at the Nanoscale

We describe here a new method for fabrication of chemical and topographical functional materials on the micrometer and on the nanometer scale. This technique entails the deposition of polymer thin films by pulsed plasma polymerization. Nanopatterning is achieved by means of DUV interferometry at 193 nm. Using this approach, it is possible to generate multi-scale topographical or chemical images and create combinatorial patterned surfaces. This procedure opens a door to the control of both chemistry and topography on polymer films at different scales ranging from nano to macro.