Electron-beam-induced deposition of copper compound with low resistivity

被引：26
|
作者：
Ochiai, Y
Fujita, J
Matsui, S
机构：
[1] Fundamental Research Laboratories, NEC Corporation, Tsukuba 305
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1996年 / 14卷 / 06期
关键词：
D O I：
10.1116/1.588687
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
Electron-beam-induced deposition of copper was performed using hexafluoro-acetyoacetonate copper vinyl-trimethy-silane (HFA . Cu . VTMS) gas. The deposition was demonstrated by using a 30 keV environmental scanning electron microscope and a 50 keV electron beam Lithography system in an atmosphere of precursor gas: HFA . Cu . VTMS. The deposition rate, composition, and electrical resistivity of the deposited material were measured. The deposition rate was 6.6 nm/(C/cm(2)) at a pressure of 160 Pa. The resistivity was 3.6 mu Omega cm at room temperature deposited at a pressure of 6.7 x 10(-4) Pa. The resistivity is the lowest so far reported. (C) 1996 American Vacuum Society.
引用
收藏
页码：3887 / 3891
页数：5
相关论文
共 50 条
  • [21] Electron-beam-induced deposition of Pt for field emitter arrays
    Morimoto, H
    Kishimoto, T
    Takai, M
    Yura, S
    Hosono, A
    Okuda, S
    Lipp, S
    Frey, L
    Ryssel, H
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1996, 35 (12B): : 6623 - 6625
  • [22] CHARACTERIZATION AND APPLICATION OF MATERIALS GROWN BY ELECTRON-BEAM-INDUCED DEPOSITION
    KOOPS, HWP
    KRETZ, J
    RUDOLPH, M
    WEBER, M
    DAHM, G
    LEE, KL
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1994, 33 (12B): : 7099 - 7107
  • [23] Electron-Beam-Induced Deposition of Platinum from a Liquid Precursor
    Donev, Eugenii U.
    Hastings, J. Todd
    NANO LETTERS, 2009, 9 (07) : 2715 - 2718
  • [24] ULTRALOW-ENERGY FOCUSED ELECTRON-BEAM-INDUCED DEPOSITION
    HOYLE, PC
    CLEAVER, JRA
    AHMED, H
    APPLIED PHYSICS LETTERS, 1994, 64 (11) : 1448 - 1450
  • [25] Lateral tunnel junction produced by electron-beam-induced deposition
    Komuro, M
    Hiroshima, H
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1997, 15 (06): : 2809 - 2815
  • [26] Periodic structure formation by focused electron-beam-induced deposition
    Bret, T
    Utke, I
    Gaillard, C
    Hoffmann, P
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2004, 22 (05): : 2504 - 2510
  • [27] Diamond tool wear measurement by electron-beam-induced deposition
    Shi, M.
    Lane, B.
    Mooney, C. B.
    Dow, T. A.
    Scattergood, R. O.
    PRECISION ENGINEERING-JOURNAL OF THE INTERNATIONAL SOCIETIES FOR PRECISION ENGINEERING AND NANOTECHNOLOGY, 2010, 34 (04): : 718 - 721
  • [28] Electron-beam-induced deposition of carbonaceous microstructures using scanning electron microscopy
    Miura, N
    Ishii, H
    Shirakashi, J
    Yamada, A
    Konagai, M
    APPLIED SURFACE SCIENCE, 1997, 113 : 269 - 273
  • [29] Electron transport properties of Pt nanoarch fabricated by electron-beam-induced deposition
    Center for Quantum Science and Technology under Extreme Conditions, Osaka University, Toyonaka, Osaka 560-8531, Japan
    Jpn. J. Appl. Phys., 6 PART 2
  • [30] Parallel electron-beam-induced deposition using a multi-beam scanning electron microscope
    Post, P. C.
    Mohammadi-Gheidari, A.
    Hagen, C. W.
    Kruit, P.
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2011, 29 (06):
12345