Role of reaction products in F- production in low-pressure, high-density CF4 plasmas

被引：16

作者：

Hayashi, D ^{[1
]}

Nakamoto, M ^{[1
]}

Takada, N ^{[1
]}

Sasaki, K ^{[1
]}

Kadota, K ^{[1
]}

机构：

[1] Nagoya Univ, Dept Elect, Nagoya, Aichi 4648603, Japan

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1999年 / 38卷 / 10期

关键词：

negative ion; F-; dissociative electron attachment; helicon-wave plasmas; CF4; plasma;

D O I：

10.1143/JJAP.38.6084

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

In this paper we report on the role of reaction products in F- production in low-pressure, high-density CF4 plasmas. The spatial distributions and temporal variations of F- density (n(-)), and plasma parameters in the discharge phase and afterglow of helicon-wave CF4 plasmas which had an electron density (n(e)) of 10(11)-10(13) cm(-3) were measured by the laser-photodetachment technique combined with a heated Langmuir probe. The relationship between the n(-)/n(e) ratio and the degree of ionization was investigated in the discharge phase. The n(-)/n(e) ratios in the plasma column of highly ionized plasmas were much higher than those expected from dissociative electron attachment to CF4, and n(-)/n(e) ratios were larger by several orders of magnitude in the outer region. The efficient increase in n(-) was observed in the afterglow and n(-)/n(e) was enhanced by increasing the discharge duration. It is concluded that the attachment to the reaction products contributes greatly to F- production in low-pressure, high-density plasmas.

引用

页码：6084 / 6089

页数：6

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