AFM nanolithography on LB films containing carboxylic acid and amine functional groups.

被引：0
|
作者：
Ahn, SJ [1 ]
Lee, HW [1 ]
机构：
[1] Hanyang Univ, Dept Chem, Sungdong Ku, Seoul 133791, South Korea
来源：
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY | 2002年 / 223卷
关键词：
D O I：
暂无
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
199-COLL
引用
收藏
页码：U413 / U413
页数：1
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