AFM nanolithography on LB films containing carboxylic acid and amine functional groups.

被引：0

作者：

Ahn, SJ ^{[1
]}

Lee, HW ^{[1
]}

机构：

[1] Hanyang Univ, Dept Chem, Sungdong Ku, Seoul 133791, South Korea

来源：

ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY | 2002年 / 223卷

关键词：

D O I：

暂无

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

199-COLL

引用

页码：U413 / U413

页数：1

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