Gate leakage tolerant circuits in deep sub-100nm CMOS technologies

被引:0
|
作者
Kang, SM [1 ]
Yang, G [1 ]
Wang, ZD [1 ]
机构
[1] Univ Calif Santa Cruz, Dept Elect Engn, Santa Cruz, CA 95064 USA
关键词
D O I
10.1117/12.530278
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The leakage power consumption in deep sub-100nm CMOS systems is projected to become a significant part of the total power dissipation. Although the dual Vt CMOS process helps reduce the subthreshold leakage current, the gate leakage problem poses a significant design challenge. We introduce gate leakage tolerant circuits. We describe two new circuit techniques to suppress gate leakage currents in dual Vt Domino circuits. In standby mode, proposed circuits generate low inputs and low outputs for all Domino stages to suppress gate leakage currents in the NMOS logic tree. Simulation results using 45nm BSIM4 SPICE models for 32-bit adders show that adders using the two proposed circuits can reduce the standby gate leakage by 66% and 90%, respectively. Proposed adders have 7% active power overhead to achieve the same speed as single Vt domino adder and the area penalty is minimal with careful layout.
引用
收藏
页码:56 / 66
页数:11
相关论文
共 50 条
  • [31] Full level alternating PSM for sub-100nm DRAM gate patterning
    Pforr, R
    Ahrens, M
    Dettmann, W
    Hennig, M
    Koehle, R
    Ludwig, B
    Morgana, N
    Thiele, J
    OPTICAL MICROLITHOGRAPHY XVI, PTS 1-3, 2003, 5040 : 232 - 243
  • [32] Self Synchronous Circuits for Error Robust Operation in Sub-100nm Processes
    Devlin, Benjamin
    Ikeda, Makoto
    Asada, Kunihiro
    2012 18TH IEEE INTERNATIONAL SYMPOSIUM ON ASYNCHRONOUS CIRCUITS AND SYSTEMS (ASYNC), 2012, : 150 - 157
  • [33] SPA plasma for sub-100nm
    Murakawa, S
    Nemoto, T
    Iizuka, V
    Yamamoto, N
    Ozaki, S
    SOLID STATE TECHNOLOGY, 2003, 46 (01) : 59 - +
  • [34] Circuits for CMOS high-speed I/O in sub-100 nm technologies
    Tamura, H
    Kibune, M
    Yamaguchi, H
    Kanda, K
    Gotoh, K
    Ishida, H
    Ogawa, J
    IEICE TRANSACTIONS ON ELECTRONICS, 2006, E89C (03) : 300 - 313
  • [35] FABRICATION OF SUB-100NM DUAL-GATE MODFETS WITH ENHANCED PERFORMANCE
    LEE, KY
    ISMAIL, K
    KERN, DP
    HONG, JM
    MICROELECTRONIC ENGINEERING, 1991, 13 (1-4) : 377 - 380
  • [36] What is the future of sub-100nm CMOS: Ultrashallow junctions or ultrathin SOI?
    Current, MI
    Bedell, SW
    Malik, IJ
    Feng, LM
    Henley, FJ
    SOLID STATE TECHNOLOGY, 2000, 43 (09) : 66 - +
  • [37] Optimization of side gate length and side gate voltage for sub-100nm double-gate MOSFET
    Kim, J
    Kim, G
    Ko, S
    Jung, H
    SMART STRUCTURES, DEVICES, AND SYSTEMS, 2002, 4935 : 308 - 315
  • [38] Sub-100nm technologies drive single-wafer wet cleaning
    Mertens, PW
    Parton, E
    SOLID STATE TECHNOLOGY, 2002, 45 (02) : 51 - +
  • [39] Designing leakage tolerant, low power wide-OR dominos for sub-130 nm CMOS technologies
    Chatterjee, B
    Sachdev, M
    Krishnamurthy, R
    MICROELECTRONICS JOURNAL, 2005, 36 (09) : 801 - 809
  • [40] Design of analog subthreshold encoded neural network circuit in sub-100nm CMOS
    Larras, Benoit
    Lahuec, Cyril
    Seguin, Fabrice
    Arzel, Matthieu
    2015 INTERNATIONAL JOINT CONFERENCE ON NEURAL NETWORKS (IJCNN), 2015,