Morphological evolution and characterization of GaN pyramid arrays fabricated by photo-assisted chemical etching

被引:3
|
作者
Zhang, Shiying [1 ,2 ,3 ]
Xiu, Xiangqian [1 ]
Xu, Qingjun [1 ,2 ]
Li, Yuewen [1 ]
Hua, Xuemei [1 ]
Chen, Peng [1 ,3 ]
Xie, Zili [1 ]
Liu, Bin [1 ]
Zhou, Yugang [1 ]
Han, Ping [1 ]
Zhang, Rong [1 ]
Zheng, Youdou [1 ]
机构
[1] Nanjing Univ, Sch Elect Sci & Engn, Key Lab Adv Photon & Elect Mat, Nanjing 210093, Jiangsu, Peoples R China
[2] Zaozhuang Univ, Coll Optoelect Engn, Zaozhuang 277160, Peoples R China
[3] Nanjing Univ, Inst Optoelect, Yangzhou 225009, Jiangsu, Peoples R China
基金
中国国家自然科学基金;
关键词
GaN pyramid arrays; Photo-assisted chemical (PAC) etching; Cathodoluminescence (CL); VAPOR-PHASE EPITAXY; GALLIUM NITRIDE; FILMS; SURFACES; ION; DISLOCATIONS; PLASMAS; STRAIN; GROWTH; PITS;
D O I
10.1016/j.spmi.2016.11.004
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
GaN pyramid arrays have been successfully synthesized by selective photo-assisted chemical etching in a K2S2O8/KOH solution. A detailed analysis of time evolution of surface morphology has been conducted, which describes an etching process of GaN pyramids. Room temperature cathodoluminescence images indicate that these pyramids are composed of crystalline GaN surrounding dislocations, which is caused by the greater recombination rate of electrons and holes at dislocation than that of crystalline GaN. The Raman results show a stress relaxation in GaN pyramids compared with unetched GaN. The optical property of both unetched GaN and GaN pyramids has been studied by photoluminescence. The formation mechanism and feature of GaN pyramids are also rationally explained. (C) 2016 Elsevier Ltd. All rights reserved.
引用
收藏
页码:1249 / 1255
页数:7
相关论文
共 50 条
  • [31] Effect of photo-assisted RIE damage in GaN Schottky structures
    Mouffak, Z
    Medelci-Djezzar, N
    Boney, C
    Bensaoula, A
    Trombetta, L
    2001 INTERNATIONAL SEMICONDUCTOR DEVICE RESEARCH SYMPOSIUM, PROCEEDINGS, 2001, : 442 - 445
  • [32] APPLICATION OF PHOTO-ASSISTED ETCHING TECHNOLOGY TO PREFERENTIAL ETCHING OF SI FOR DIELECTRICALLY ISOLATED STRUCTURE
    OZAWA, K
    ITO, T
    ISHIKAWA, H
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1987, 26 (09): : 1509 - 1512
  • [33] The Role of Alternating Current on Photo-Assisted Electrochemical Porosification of GaN
    Mahmood, Ainorkhilah
    Ahmed, Naser M.
    Tiginyanu, Ion
    Yusof, Yushamdan
    Kwong, Yam Fong
    Siang, Chuah Lee
    Hassan, Zainuriah
    JOURNAL OF NANOELECTRONICS AND OPTOELECTRONICS, 2014, 9 (02) : 287 - 290
  • [34] Optical assessment of silicon nanowire arrays fabricated by metal-assisted chemical etching
    Shinya Kato
    Yasuyoshi Kurokawa
    Yuya Watanabe
    Yasuharu Yamada
    Akira Yamada
    Yoshimi Ohta
    Yusuke Niwa
    Masaki Hirota
    Nanoscale Research Letters, 8
  • [35] Optical assessment of silicon nanowire arrays fabricated by metal-assisted chemical etching
    Kato, Shinya
    Kurokawa, Yasuyoshi
    Watanabe, Yuya
    Yamada, Yasuharu
    Yamada, Akira
    Ohta, Yoshimi
    Niwa, Yusuke
    Hirota, Masaki
    NANOSCALE RESEARCH LETTERS, 2013, 8 : 1 - 6
  • [36] Compact System for Colorimetric Sensor Arrays Characterization Based on Computer Screen Photo-Assisted Technology
    Gugliandolo, Giovanni
    Pilato, Giovanni
    Donato, Nicola
    ELECTRONICS, 2021, 10 (21)
  • [37] GaN nanowire fabricated by selective wet-etching of GaN micro truncated-pyramid
    Chen, Weijie
    Lin, Jiali
    Hu, Guoheng
    Han, Xiaobiao
    Liu, Minggang
    Yang, Yibin
    Wu, Zhisheng
    Liu, Yang
    Zhang, Baijun
    JOURNAL OF CRYSTAL GROWTH, 2015, 426 : 168 - 172
  • [38] Photo-assisted silicon micromachining: Opportunities for chemical sensing
    Tuller, HL
    Mlcak, R
    SENSORS AND ACTUATORS B-CHEMICAL, 1996, 35 (1-3) : 255 - 261
  • [39] Recent Advancement in Charge and Photo-assisted Non-contact Electrical Characterization of SiC, GaN, and AlGaN/GaN HEMT
    Findlay, Andrew
    Wilson, Marshall
    Savtchouk, Alexandre
    D'Amico, John
    Lagowski, Jacek
    Hillard, Robert
    GALLIUM NITRIDE AND SILICON CARBIDE POWER TECHNOLOGIES 7, 2017, 80 (07): : 261 - 274
  • [40] APPLICATION OF PHOTO-ASSISTED ETCHING TECHNOLOGY TO PREFERENTIAL ETCHING OF Si FOR DIELECTRICALLY ISOLATED STRUCTURE.
    Ozawa, Kiyoshi
    Ito, Takashi
    Ishikawa, Hajime
    1600, (26):