Hydrogen site location in ultrathin vanadium layers by N-15 nuclear reaction analysis

被引:4
|
作者
Komander, K. [1 ,2 ]
Moro, M. V. [1 ]
Droulias, S. A. [1 ]
Mueggenburg, J. [3 ]
Palsson, G. K. [1 ]
Nyberg, T. [4 ]
Primetzhofer, D. [1 ]
Wolff, M. [1 ]
机构
[1] Uppsala Univ, Dept Phys & Astron, Box 516, S-75120 Uppsala, Sweden
[2] Humboldt Univ, Newtonstr 15, D-12489 Berlin, Germany
[3] Marburg Univ, Fac Math & Comp Sci, Hans Meerwein Str 6, D-35032 Marburg, Germany
[4] Uppsala Univ, Dept Engn Sci, Box 534, S-75120 Uppsala, Sweden
关键词
NRA; Metal hydride; Site occupancy; Channeling; N-15; Vanadium; LATTICE LOCATION; DEUTERIUM; STRAIN;
D O I
10.1016/j.nimb.2019.05.033
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
We present a method using resonant nuclear reaction analysis combined with optical transmission and heavy-ion Rutherford backscattering spectrometry to study the absorption of hydrogen in single crystalline thin vanadium films. Probing with the resonant H-1(N-15,alpha gamma)C-12 reaction allows for highly resolved hydrogen depth profiling, while measurements along the crystal axes render possible the direct identification of the interstitial site occupancy. First experiments were performed on thin vanadium hydrides in Fe(Cr)/V superlattices revealing differences in site occupancy.
引用
收藏
页码:57 / 60
页数:4
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