Modeling of body factor and subthreshold swing in bulk metal oxide semiconductor field effect transistors in short-channel regime

被引:1
|
作者
Putra, Arifin Tamsir [1 ]
Saitoh, Masumi [1 ]
Tsutsui, Gen [1 ]
Hiramoto, Toshiro [1 ]
机构
[1] Univ Tokyo, Inst Ind Sci, Meguro Ku, Tokyo 1538505, Japan
关键词
capacitance network model; short-channel effect; SCE; drain-induced barrier lowering; DIBL;
D O I
10.1143/JJAP.45.6173
中图分类号
O59 [应用物理学];
学科分类号
摘要
A compact and empirical model of subthreshold swing S and body factor gamma is developed in bulk metal oxide semiconductor field effect transistor (MOSFET) in the short-channel regime. Although the relation between S and gamma is simply given as S = 60(l + gamma) in the long-channel regime, this relation no longer holds in the short-channel regime due to the short channel effect (SCE). The model is derived using the capacitance network model and by fitting analytical equations to two-dimensional device simulation results. It is confirmed that the model is valid not only at low drain voltage but also at high drain voltage considering the effect of drain-induced barrier lowering. This model is very effective in the design of variable threshold-voltage complementary metal oxide semiconductor (VTCMOS) circuits.
引用
收藏
页码:6173 / 6176
页数:4
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