Transconductance improvement technique for bulk-driven OTA in nanometre CMOS process

被引:19
|
作者
Zhao, Xiao [1 ]
Fang, Huajun [2 ]
Ling, Tong [2 ]
Xu, Jun [2 ]
机构
[1] China Univ Geosci, Sch Geophys & Informat Technol, Beijing 100083, Peoples R China
[2] Tsinghua Univ, Inst Microelect, Beijing 100084, Peoples R China
关键词
D O I
10.1049/el.2015.1559
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A transconductance improvement technique for a bulk-driven operational transconductance amplifier (OTA) working in the weak inversion region is presented. Using the quasi-floating gate method, the proposed technique achieves larger transconductance improvement than conventional approaches with the CMOS technologies scaling. Moreover, its enhanced performance is at no expense of the power budget. Simulated on UMC 180 nm technology, the results demonstrate that the proposed bulk-driven OTA achieves more than two times gain-bandwidth improvement than that of the traditional counterpart with the same power.
引用
收藏
页码:1758 / +
页数:2
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