Morphological stability of the Stranski-Krastanow systems under an electric field

被引：5
|
作者：
Chiu, C. -h. [1 ]
Poh, C. T. [1 ]
Huang, Z. [1 ]
机构：
[1] Natl Univ Singapore, Dept Mat Sci & Engn, Singapore 117576, Singapore
来源：
APPLIED PHYSICS LETTERS | 2006年 / 88卷 / 24期
关键词：
D O I：
10.1063/1.2212052
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
The morphological stability of the Stranski-Krastanow (SK) system against surface undulation is investigated for the case where the SK system consists of a conductor film and a thick substrate and it is under the influence of an electric field induced by an electrode above the film. It is shown that a flat electrode reduces the critical thickness below which the SK system is completely stable against surface undulation. Applying a wavy electrode to the completely stable system, on the other hand, causes the flat film surface to develop into an equilibrium ripple profile.
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页数：3
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