Optical and electrical properties of GaMnN films grown by molecular-beam epitaxy

被引:45
|
作者
Polyakov, AY
Govorkov, AV
Smirnov, NB
Pashkova, NY
Thaler, GT
Overberg, ME
Frazier, R
Abernathy, CR
Pearton, SJ
Kim, J
Ren, F
机构
[1] Inst Rare Met, Moscow 109017, Russia
[2] Univ Florida, Dept Mat Sci & Engn, Gainesville, FL 32611 USA
[3] Univ Florida, Dept Chem Engn, Gainesville, FL 32611 USA
关键词
D O I
10.1063/1.1510597
中图分类号
O59 [应用物理学];
学科分类号
摘要
Optical absorption spectra, microcathodoluminescence (MCL) spectra, and electrical properties of GaMnN films grown by molecular-beam epitaxy with Mn concentration in the range of 3 to 10 at. % were studied. Optical absorption and MCL spectra show the presence of strong bands corresponding to the transition from the Mn acceptors near E-c-2 eV to the conduction band. The other strong band observed in MCL measurements was the blue band peaked near 2.9 eV and associated with the transition from the valence band to deep donors with a level near E-c-0.5 eV. All GaMnN samples were shown to be lightly n-type which suggests close self-compensation of the Mn acceptors by some native defect donors. A plausible scenario is that such compensating donors could be due to nitrogen vacancies and that the E-c-0.5 eV donor defects are complexes between the Mn acceptors and the nitrogen vacancy donors. (C) 2002 American Institute of Physics.
引用
收藏
页码:4989 / 4993
页数:5
相关论文
共 50 条
  • [1] Magnetic and optical properties of GaMnN grown by ammonia-source molecular-beam epitaxy
    Hashimoto, M
    Zhou, YK
    Tampo, H
    Kanamura, M
    Asahi, H
    [J]. JOURNAL OF CRYSTAL GROWTH, 2003, 252 (04) : 499 - 504
  • [2] Electrical and optical properties of CdHgTe films grown by molecular-beam epitaxy on silicon substrates
    I. I. Izhnin
    K. D. Mynbaev
    M. V. Yakushev
    A. I. Izhnin
    E. I. Fitsych
    N. L. Bazhenov
    A. V. Shilyaev
    H. V. Savitskyy
    R. Jakiela
    A. V. Sorochkin
    V. S. Varavin
    S. A. Dvoretsky
    [J]. Semiconductors, 2012, 46 : 1341 - 1345
  • [3] ELECTRICAL AND OPTICAL-PROPERTIES OF INDIUM ARSENIDE FILMS GROWN BY MOLECULAR-BEAM EPITAXY
    BZINKOVSKAYA, IS
    KANTER, YO
    KOLOSANOV, VA
    REVENKO, MA
    FEDOROV, AA
    [J]. INORGANIC MATERIALS, 1990, 26 (04) : 585 - 588
  • [4] Electrical and optical properties of CdHgTe films grown by molecular-beam epitaxy on silicon substrates
    Izhnin, I. I.
    Mynbaev, K. D.
    Yakushev, M. V.
    Izhnin, A. I.
    Fitsych, E. I.
    Bazhenov, N. L.
    Shilyaev, A. V.
    Savitskyy, H. V.
    Jakiela, R.
    Sorochkin, A. V.
    Varavin, V. S.
    Dvoretsky, S. A.
    [J]. SEMICONDUCTORS, 2012, 46 (10) : 1341 - 1345
  • [5] Electrical and optical properties of ZnO films grown by molecular beam epitaxy
    Wang, S. P.
    Shan, C. X.
    Yao, B.
    Li, B. H.
    Zhang, J. Y.
    Zhao, D. X.
    Shen, D. Z.
    Fan, X. W.
    [J]. APPLIED SURFACE SCIENCE, 2009, 255 (09) : 4913 - 4915
  • [6] Optical and electrical properties of AlCrN films grown by molecular beam epitaxy
    Polyakov, AY
    Smirnov, NB
    Govorkov, AV
    Frazier, RM
    Liefer, JY
    Thaler, GT
    Abernathy, CR
    Pearton, SJ
    Zavada, JM
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2004, 22 (06): : 2758 - 2763
  • [7] Electrical and optical properties of GaCrN films grown by molecular beam epitaxy
    Polyakov, AY
    Smirnov, NB
    Govorkov, AV
    Thaler, GT
    Frazier, RM
    Abernathy, CR
    Pearton, SJ
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2005, 23 (01): : 1 - 4
  • [8] IMPROVEMENTS OF ELECTRICAL AND OPTICAL-PROPERTIES OF INALAS GROWN BY MOLECULAR-BEAM EPITAXY
    KAWAMURA, Y
    NAKASHIMA, K
    ASAHI, H
    [J]. JOURNAL OF APPLIED PHYSICS, 1985, 58 (08) : 3262 - 3264
  • [9] Influence of heat treatments on electrical properties of ZnO films grown by molecular-beam epitaxy
    Oh, D. C.
    Park, S. H.
    Goto, H.
    Im, I. H.
    Jung, M. N.
    Chang, J. H.
    Yao, T.
    Song, J. S.
    Bae, C. H.
    Han, C. S.
    Koo, K. W.
    [J]. APPLIED PHYSICS LETTERS, 2009, 95 (15)
  • [10] Optical and electrical properties of Al1-xInxN films grown by plasma source molecular-beam epitaxy
    Lukitsch, MJ
    Danylyuk, YV
    Naik, VM
    Huang, C
    Auner, GW
    Rimai, L
    Naik, R
    [J]. APPLIED PHYSICS LETTERS, 2001, 79 (05) : 632 - 634