Plasma Electrode Structure Suitable for H- Extraction form Bernas Type Ion Source

被引：1

作者：

Ishikawa, M. ^{[1
]}

Oura, K. ^{[1
]}

Miyamoto, N. ^{[1
]}

Wada, M. ^{[1
]}

机构：

[1] Doshisha Univ, Grad Sch Sci & Engn, Kyoto 6100321, Japan

来源：

SIXTH INTERNATIONAL SYMPOSIUM ON NEGATIVE IONS, BEAMS AND SOURCES (NIBS 2018) | 2018年 / 2052卷

关键词：

D O I：

10.1063/1.5083778

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The plasma electrode stnicture of a Bernas type ion source was modified to increase negative hydrogen (H-) ion current. On the previous geometry the plasma electrodes was installed inside the ion source while the new geometry has the plasma electrode outside discharge chamber. The It ion beam current increased by positively biasing the plasma electrode to improve the ratio of the negative ion current and the extraction current to 2.4 times the original ratio for the electrode installed inside. The It ion beam current increased 1.2 times enhancement by tantalum (Ta) filament was also attempted. The Ta filament produce 20 % more H- ion current and reduced extraction current by 50 %. The overall improvement by plasma electrode structure and Ta filament made the it ion to extraction current ratio to double.

引用

页数：6

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