Growth and optical damage properties of In:Zn:LiNbO3 waveguide substrate

被引:2
|
作者
Nie, Yiran [1 ]
Wang, Rui
Wang, Biao
机构
[1] Harbin Inst Technol, Dept Aerosp Engn & Mech, Harbin 150001, Peoples R China
[2] Harbin Inst Technol, Ctr Electroopt Technol, Harbin 150001, Peoples R China
[3] Harbin Inst Technol, Dept Appl Chem, Harbin 150001, Peoples R China
[4] Harbin Inst Technol, Ctr Electroopt Technol, Harbin 150001, Peoples R China
[5] Sun Yat Sen Univ, Sch Phys & Engn, State Key Lab Optoelect Mat & Technol, Guangzhou 510275, Peoples R China
关键词
In : Zn : LiNbO3 crystal; optical damage; waveguide substrate; m-line method;
D O I
10.1002/crat.200610764
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
In:Zn:LiNbO3 crystals doped with different indium concentrations were grown by Czochralski technique. The optical damage threshold value and ultraviolet-visible absorption spectra of the In:Zn:LiNbO3 crystals were measured. The In:Zn:LiNbO3 crystals were made into optical waveguide substrates using hexanedioic acid as proton exchange agent. The optical damage resistant ability of those optical waveguide substrates was investigated by the m-line method. The optical damage threshold values of In(2mol.%):Zn(3mol.%):LiNbO3 crystal and optical waveguide substrate are two orders of magnitude higher than those of pure LiNbO3. (c) 2007 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
引用
收藏
页码:23 / 26
页数:4
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