InP/GaAsSb/InP double heterojunction bipolar transistors (invited)

被引:0
|
作者
Bolognesi, CR [1 ]
Dvorak, MW [1 ]
Watkins, SP [1 ]
机构
[1] Simon Fraser Univ, Sch Engn Sci, Burnaby, BC V5A 1S6, Canada
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中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
InP/GaAsSb/InP double heterojunction bipolar transistors (DHBTs) are some of the fastest bipolar transistors and maximum ever fabricated, with cut-rent gain cutoff oscillation frequencies simultaneously exceeding 300 GHz while maintaining breakdown voltages BVCEO > 6 V. InP/GaAsSb/InP DHBTs are particularly appealing because excellent device figures of merit are achievable with relatively simple structures involving abrupt junctions and uniform doping levels and compositions: this is a tremendous manufacturability advantage in comparison to GaInAs-based alternatives. This paper highlights some important physical aspects of the use of GaAsSb base layers. In particular, we will describe the implications of the staggered band lineup at the E/B and B/C heterojunctions for charge storage in the devices, and show that InP/GaAsSb/InP DHBTs offer inherent advantages with direct implications to applications in high-speed digital circuits.
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页码:265 / 268
页数:4
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