Electron mobility enhancement in AlN/GaN/AlN heterostructures with InGaN nanogrooves

被引:33
|
作者
Pokatilov, E. P. [1 ]
Nika, D. L. [1 ]
Balandin, A. A. [1 ]
机构
[1] Univ Calif Riverside, Dept Elect Engn, Nanodevice Lab, Riverside, CA 92521 USA
基金
美国国家科学基金会;
关键词
D O I
10.1063/1.2349302
中图分类号
O59 [应用物理学];
学科分类号
摘要
The authors show that the electron mobility can be strongly enhanced in AlN/GaN/AlN heterostructures with the shallow InxGa1-xN channel-nanogroove-in the middle of the potential well. The modified heterostructure has the room-temperature electron mobility, which is five times larger than that in conventional quantum wells. The maximum mobility enhancement is achieved for In content x approximate to 0.05, which is sufficient to weaken the intersubband electron scattering without leading to the substantial electron-interface-phonon scattering. The mobility enhancement is pronounced for a wide range of the carrier densities (10(11)-10(13) cm(-2)), which is important for GaN technology. (c) 2006 American Institute of Physics.
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页数:3
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