Fabrication of low-density solid xenon as laser-produced plasma extreme ultraviolet source

被引:2
|
作者
Nagata, Mizuho [1 ]
Norimatsu, Takayoshi [1 ]
Nakai, Mitsuo [1 ]
Nagai, Keiji [1 ]
Ueda, Nobuyoshi [1 ]
Fujioka, Shinsuke [1 ]
Aota, Tatsuya [1 ]
Nishimura, Hiroaki [1 ]
Nishihara, Katsunobu [1 ]
Miyanaga, Noriaki [1 ]
Izawa, Yasukazu [1 ]
Mima, Kunioki [1 ]
机构
[1] Osaka Univ, Inst Laser Engn, Suita, Osaka 5650871, Japan
关键词
laser-produced EUV source; low-density solid xenon; atomization; swirl atomizer;
D O I
10.1143/JJAP.45.L884
中图分类号
O59 [应用物理学];
学科分类号
摘要
A low-density solid xenon (Xe) target has been developed as laser-produced plasma (LPP) extreme ultraviolet (EUV) source. Xe gas was cooled to below the condensation temperature, and liquid Xe was sprayed from a swirl atomizer into a low-pressure atmosphere. Microparticles of liquid Xe were rapidly cooled by their own latent heat of evaporation, and became a solid micrometer-sized powder. The most frequent particle diameter under an atomizing pressure of 0.3 MPa was 114 mu m, and the apparent density was 0.2 g/cm(3) 1/13 of the density of conventional solid Xe. The apparent production rate of the powder was 2.2 cm(3)/s.
引用
收藏
页码:L884 / L886
页数:3
相关论文
共 50 条
  • [21] Development of laser-produced plasma sources for extreme ultraviolet lithography
    O'Sullivan, Gerry
    Li, Bowen
    JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS, 2012, 11 (02):
  • [22] MACROSCOPIC SELF-FOCUSING EFFECTS IN A LASER-PRODUCED LOW-DENSITY PLASMA
    LUCCHESI, M
    CORNOLTI, F
    GIULIETTI, A
    GIULIETTI, D
    VASELLI, M
    NUOVO CIMENTO DELLA SOCIETA ITALIANA DI FISICA B-GENERAL PHYSICS RELATIVITY ASTRONOMY AND MATHEMATICAL PHYSICS AND METHODS, 1984, 82 (01): : 111 - 124
  • [23] Research progress on laser-produced plasma light source for 13.5 nm extreme ultraviolet lithography
    Zong Nan
    Hu Wei-min
    Wang Zhi-min
    Wang Xiao-jun
    Zhang Shen-jin
    Bo Yong
    Peng Qin-Jun
    Xu Zu-yan
    CHINESE OPTICS, 2020, 13 (01): : 28 - 42
  • [24] Development of a liquid tin microjet target for an efficient laser-produced plasma extreme ultraviolet source
    Higashiguchi, Takeshi
    Hamada, Masaya
    Kubodera, Shoichi
    REVIEW OF SCIENTIFIC INSTRUMENTS, 2007, 78 (03):
  • [25] Mitigation of fast ions from laser-produced Sn plasma for an extreme ultraviolet lithography source
    Tao, Y.
    Tillack, M. S.
    APPLIED PHYSICS LETTERS, 2006, 89 (11)
  • [26] Radiative properties and hydrodynamics of laser-produced tin plasma for efficient extreme ultraviolet light source
    Fujioka, S.
    Nishimura, H.
    Nishihara, K.
    Tao, Y.
    Aota, T.
    Ando, T.
    Nagai, K.
    Norimatsu, T.
    Miyanaga, N.
    Izawa, Y.
    Mima, K.
    Tanuma, H.
    Ohnishi, H.
    Sunahara, A.
    Shimada, Y.
    Sasaki, A.
    X-RAY LASERS 2006, PROCEEDINGS, 2007, 115 : 607 - +
  • [27] Calculation of the extreme-ultraviolet radiation conversion efficiency for a laser-produced tin plasma source
    Masnavi, Majid
    Parchamy, Homaira
    PHYSICS OPEN, 2019, 1
  • [28] Behavior of debris from laser-produced plasma for extreme ultraviolet light source measured by laser imaging technique
    Tanaka, Hiroki
    Hashimoto, Yuki
    Tamaru, Kouji
    Takahashi, Akihiko
    Okada, Tatsuo
    APPLIED PHYSICS LETTERS, 2006, 89 (18)
  • [29] Ultimate efficiency of extreme ultraviolet radiation from a laser-produced plasma
    Aota, T
    Tomie, T
    PHYSICAL REVIEW LETTERS, 2005, 94 (01)
  • [30] Effect of Plasma Density on Discharge Produced Plasma Extreme Ultraviolet Source
    Xu Qiang
    Zhao Yong-peng
    Wang Qi
    Yang Yong-tao
    SPECTROSCOPY AND SPECTRAL ANALYSIS, 2017, 37 (08) : 2560 - 2563