共 50 条
- [41] Introduction of full level alternating phase shift mask technology into IC manufacturing OPTICAL MICROLITHOGRAPHY XV, PTS 1 AND 2, 2002, 4691 : 89 - 97
- [42] Impact of alternating phase shift mask quality on 100 nm gate lithography 20TH ANNUAL BACUS SYMPOSIUM ON PHOTOMASK TECHNOLOGY, 2000, 4186 : 423 - 432
- [43] Phase defect inspection of 130 nm node phase shift masks using a simultaneous transmitted and reflected light pattern inspection algorithm 17TH EUROPEAN CONFERENCE ON MASK TECHNOLOGY FOR INTEGRATED CIRCUITS AND MICROCOMPONENTS, 2001, 4349 : 170 - 174
- [45] Alternating phase-shift mask and binary mask for 45-nm node and beyond: The impact on the mask error control PHOTOMASK AND NEXT-GENERATION LITHOGRAPHY MASK TECHNOLOGY XIV, PTS 1 AND 2, 2007, 6607
- [46] Preliminary study of 65 nm-node alternating phase shift mask fabrication 22ND ANNUAL BACUS SYMPOSIUM ON PHOTOMASK TECHNOLOGY, PTS 1 AND 2, 2002, 4889 : 1273 - 1280
- [47] Study of alternating phase shift mask structure for 65nm node devices 23RD ANNUAL BACUS SYMPOSIUM ON PHOTOMASK TECHNOLOGY, PTS 1 AND 2, 2003, 5256 : 880 - 888
- [48] Improving 90nm FPGA chips with an alternating phase-shift mask MICROLITHOGRAPHY WORLD, 2006, 15 (04): : 12 - 15
- [49] Characterizing the process window of a double exposure dark field alternating phase shift mask DESIGN, PROCESS INTEGRATION, AND CHARACTERIZATION FOR MICROELECTRONICS, 2002, 4692 : 454 - 464
- [50] Measurement method for odd component of aberration function utilizing alternating phase shift mask JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1998, 37 (12B): : 6709 - 6713