Alternating phase shift mask inspection using multiple simultaneous illumination techniques

被引：2

作者：

Zurbrick, L ^{[1
]}

Heumann, J ^{[1
]}

Rudzinski, M ^{[1
]}

Stokowski, S ^{[1
]}

Urbach, JP ^{[1
]}

Wang, LT ^{[1
]}

机构：

[1] KLA Tencor Corp, San Jose, CA 95134 USA

来源：

PHOTOMASK AND NEXT-GENERATION LITHOGRAPHY MASK TECHNOLOGY IX | 2002年 / 4754卷

关键词：

D O I：

10.1117/12.476919

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

This paper discusses the challenges to alternating phase shift mask defect inspection and new approaches for phase defect detection using multiple illumination methods in conjunction with defect detection algorithm modifications. Die-to-die inspection algorithms were developed for the KLA-Tencor 365UV-HR (APS algorithm) and TeraStar SLF27 (TeraPhase algorithm) inspection systems based upon the use of simultaneous transmitted and reflected light signals. The development of an AltPSM programmed test vehicle is described and defect sensitivity characterization results from programmed phase defect reticles are presented. A comparison of the two approaches used for the different inspection systems is discussed. A comparison of TeraPhase to transmitted light only results from a programmed phase defect test mask shows improved phase defect detection results.

引用

页码：511 / 516

页数：6

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