共 50 条
- [1] Alternating phase shift mask inspection through the use of phase contrast enhancement techniques 22ND ANNUAL BACUS SYMPOSIUM ON PHOTOMASK TECHNOLOGY, PTS 1 AND 2, 2002, 4889 : 241 - 246
- [2] New approaches to alternating phase shift mask inspection 21ST ANNUAL BACUS SYMPOSIUM ON PHOTOMASK TECHNOLOGY, PTS 1 AND 2, 2002, 4562 : 138 - 144
- [4] Swing effects in alternating phase shift mask lithography:: Implications of low σ illumination JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2006, 24 (05): : 2326 - 2330
- [5] Inspection of alternating phase shift masks through the use of phase contrast techniques 19TH EUROPEAN CONFERENCE ON MASK TECHNOLOGY FOR INTEGRATED CIRCUITS AND MICROCOMPONENTS, 2003, 5148 : 107 - 112
- [6] Investigation of phase shift mask shifter defect printability and inspection techniques PHOTOMASK AND X-RAY MASK TECHNOLOGY III, 1996, 2793 : 242 - 250
- [8] Phase controllability improvement for alternating phase shift mask 18TH ANNUAL SYMPOSIUM ON PHOTOMASK TECHNOLOGY AND MANAGEMENT, 1998, 3546 : 253 - 269
- [9] Photolithography system using a combination of modified illumination and phase shift mask Kamon, Kazuya, 1600, (31):
- [10] Tritone inspection for embedded phase shift mask 20TH ANNUAL BACUS SYMPOSIUM ON PHOTOMASK TECHNOLOGY, 2000, 4186 : 818 - 826