EUV source radiated from pinch plasma for semiconductor manufacturing

被引：0
|
作者：
Zhang, C. H. [1 ,2 ]
Katsuki, S. [1 ]
Akiyama, H. [1 ]
Xu, D. G. [2 ]
机构：
[1] Kumamoto Univ, Dept Elect & Comp Engn, Kumamoto, Japan
[2] Harbin Inst Technol, Sch Elect Engn, Harbin, Heilongjiang, Peoples R China
来源：
EDM 2006: 7TH ANNUAL INTERNATIONAL WORKSHOP AND TUTORIALS ON ELECTRON DEVICES AND MATERIALS, PROCEEDINGS | 2006年
关键词：
EUV sources; z-pinch; xenon emissions; tin plasma; lithography;
D O I：
暂无
中图分类号：
O42 [声学];
学科分类号：
070206 ; 082403 ;
摘要：
引用
收藏
页码：14 / 14
页数：1
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