Characterization of zinc blende InxGa1-xN grown by radio frequency plasma assisted molecular beam epitaxy on GaAs (001)

被引:0
|
作者
Mullhauser, JR
Jenichen, B
Wassermeier, M
Brandt, O
Ploog, KH
机构
关键词
D O I
暂无
中图分类号
O59 [应用物理学];
学科分类号
摘要
Successful growth of a cubic In0.17Ga0.83N/GaN structure exhibiting blue luminescence at temperatures up to 500 K is reported. Atomic force microscopy and x-ray diffraction are used to analyze the morphological and crystalline properties of the sample. Photoluminescence measurements reveal broad, but well defined emission with a maximum at 440-450 nm in the temperature range of 5-500 K. A line-shape analysis of the spectra, as well as measurements of the absorption coefficient, allow an estimation of the band-gap energy of the cubic In0.17Ga0.83N epilayer. (C) 1997 American Institute of Physics.
引用
收藏
页码:909 / 911
页数:3
相关论文
共 50 条
  • [1] Zinc blende GaN grown by radio frequency plasma assisted molecular beam epitaxy
    Cho, HD
    Ko, NH
    Park, SH
    Kang, TW
    Han, JW
    Eom, KS
    Won, SH
    Jung, KS
    [J]. JOURNAL OF CRYSTAL GROWTH, 1997, 175 : 125 - 128
  • [2] Piezoelectric photothermal and photoreflectance spectra of InxGa1-xN grown by radio-frequency molecular beam epitaxy
    Kawano, Eiki
    Uchibori, Yuki
    Shimohara, Takashi
    Komaki, Hironori
    Katayama, Ryuji
    Onabe, Kentaro
    Fukuyama, Atsuhiko
    Ikari, Tetsuo
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2006, 45 (5B): : 4601 - 4603
  • [3] Microstructure of InxGa1-xN nanorods grown by molecular beam epitaxy
    Webster, R. F.
    Soundararajah, Q. Y.
    Griffiths, I. J.
    Cherns, D.
    Novikov, S. V.
    Foxon, C. T.
    [J]. SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 2015, 30 (11)
  • [4] GROWTH OF INXGA1-XN AND INXAL1-XN ON GAAS METALORGANIC MOLECULAR-BEAM EPITAXY
    ABERNATHY, CR
    MACKENZIE, JD
    BHARATAN, SR
    JONES, KS
    PEARTON, SJ
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1995, 13 (03): : 716 - 718
  • [5] GOOD OPTICAL QUALITY InxGa1-xN THIN FILMS GROWN ON Si(111) BY PLASMA-ASSISTED MOLECULAR BEAM EPITAXY
    Ramizy, A.
    Hammed, M. G.
    Al-Jumaili, M. H.
    Hasssan, Z.
    [J]. JOURNAL OF NON-OXIDE GLASSES, 2018, 10 (02): : 43 - 48
  • [6] High nitrogen flux plasma-assisted molecular beam epitaxy growth of InxGa1-xN films
    Jorgensen, Kelsey F.
    Bonef, Bastien
    Speck, James S.
    [J]. JOURNAL OF CRYSTAL GROWTH, 2020, 546
  • [7] Full-composition-graded InxGa1-xN films grown by molecular beam epitaxy
    Zheng, X. T.
    Wang, T.
    Wang, P.
    Sun, X. X.
    Wang, D.
    Chen, Z. Y.
    Quach, P.
    Wang, Y. X.
    Yang, X. L.
    Xu, F. J.
    Qin, Z. X.
    Yu, T. J.
    Ge, W. K.
    Shen, B.
    Wang, X. Q.
    [J]. APPLIED PHYSICS LETTERS, 2020, 117 (18)
  • [8] Domain structure in chemically ordered InxGa1-xN alloys grown by molecular beam epitaxy
    Doppalapudi, D
    Basu, SN
    Moustakas, TD
    [J]. JOURNAL OF APPLIED PHYSICS, 1999, 85 (02) : 883 - 886
  • [9] Nitrogen-Plasma Energetics Effect on Phase Separation of InxGa1-xN Nanorods Grown by RF-Plasma Assisted Molecular Beam Epitaxy
    Seo, Hye-Won
    Hamad, Samir M.
    Norman, Dever P.
    Keles, Filiz
    Chen, Quark Y.
    [J]. APPLIED PHYSICS EXPRESS, 2013, 6 (11)
  • [10] InxGa1-xN Alloys Grown by Plasma-Assisted Molecular Beam Epitaxy (PAMBE) with Growth Rates Up to 1.3 μm/hr
    Jorgensen, Kelsey F.
    Speck, James S.
    [J]. 2019 COMPOUND SEMICONDUCTOR WEEK (CSW), 2019,