Test structures for CMOS-compatible silicon pressure sensors reliability characterization

被引：0
|
作者：
Montané, E [1 ]
Bota, S [1 ]
Marco, S [1 ]
Carmona, M [1 ]
Samitier, J [1 ]
机构：
[1] Univ Barcelona, Dept Fis Aplicada & Elect, E-08028 Barcelona, Spain
来源：
DESIGN, TEST, INTEGRATION, AND PACKAGING OF MEMS/MOEMS, PROCEEDINGS | 2000年 / 4019卷
关键词：
pressure sensor; CMOS; test structures; piezoresistors;
D O I：
10.1117/12.382301
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Pressure sensors structures have been fabricated in a commercial CMOS foundry technology using a post-processing for back-side wafer micromachining. In order to predict the sensor response to an externally applied differential pressure, the structure behavior has been simulated by Finite Element Methods. The design and fabrication of test structures for these sensor devices is described. Experimental results obtained using these structures are presented.
引用
收藏
页码：250 / 256
页数：7
相关论文
共 50 条
  • [31] CMOS-Compatible Fabrication, Micromachining, and Bonding Strategies for Silicon Photonics
    Heck, John
    Jones, Richard
    Paniccia, Mario J.
    ADVANCED FABRICATION TECHNOLOGIES FOR MICRO/NANO OPTICS AND PHOTONICS IV, 2011, 7927
  • [32] CMOS-compatible Athermal Tunable Silicon Optical Lattice Filters
    Lu, Liangjun
    Zhou, Linjie
    Sun, Xiaomeng
    Xie, Jingya
    Zou, Zhi
    Li, Xinwan
    Chen, Jianping
    2013 OPTICAL FIBER COMMUNICATION CONFERENCE AND EXPOSITION AND THE NATIONAL FIBER OPTIC ENGINEERS CONFERENCE (OFC/NFOEC), 2013,
  • [33] CMOS-compatible catalytic growth of graphene on a silicon dioxide substrate
    Lee, Jae-Hyun
    Kim, Min-Sung
    Lim, Jae-Young
    Jung, Su-Ho
    Kang, Seog-Gyun
    Shin, Hyeon-Jin
    Choi, Jae-Young
    Hwang, Sung-Woo
    Whang, Dongmok
    APPLIED PHYSICS LETTERS, 2016, 109 (05)
  • [34] Fabrication of CMOS-Compatible Nanopillars for Smart Bio-Mimetic CMOS Image Sensors
    Saffih, Faycal
    Elshurafa, Amro M.
    Mohammad, Mohammad Ali
    Nelson-Fitzpatrick, Nathaniel
    Evoy, Stephane
    2012 IEEE 10TH INTERNATIONAL NEW CIRCUITS AND SYSTEMS CONFERENCE (NEWCAS), 2012, : 333 - 336
  • [35] Graphene Membranes for Hall Sensors and Microphones Integrated with CMOS-Compatible Processes
    Wittmann, Sebastian
    Glacer, Christoph
    Wagner, Stefan
    Pindl, Stephan
    Lemme, Max C.
    ACS APPLIED NANO MATERIALS, 2019, 2 (08): : 5079 - 5085
  • [36] CMOS-compatible plasmonic hydrogen sensors with a detection limit of 40 ppm
    Yue, Song
    Hou, Yu
    Wang, Ran
    Liu, Song
    Li, Man
    Zhang, Zhe
    Hou, Maojing
    Wang, Yu
    Zhang, Zichen
    OPTICS EXPRESS, 2019, 27 (14): : 19331 - 19347
  • [37] Characterization and modeling of CMOS-compatible acoustical particle velocity sensors for applications requiring low supply voltages
    Piotto, M.
    Butti, F.
    Zanetti, E.
    Di Pancrazio, A.
    Iannaccone, G.
    Bruschi, P.
    SENSORS AND ACTUATORS A-PHYSICAL, 2015, 229 : 192 - 202
  • [38] Optimization of high Q CMOS-compatible microwave inductors using silicon CMOS technology
    Park, M
    Lee, S
    Yu, HK
    Nam, KS
    1997 IEEE RADIO FREQUENCY INTEGRATED CIRCUITS (RFIC) SYMPOSIUM: DIGEST OF TECHNICAL PAPERS, 1997, : 181 - 184
  • [39] Optimization of high Q CMOS-compatible microwave inductors using silicon CMOS technology
    Park, M
    Lee, SH
    Yu, HK
    Nam, KS
    1997 IEEE MTT-S INTERNATIONAL MICROWAVE SYMPOSIUM DIGEST, VOLS I-III: HIGH FREQUENCIES IN HIGH PLACES, 1997, : 129 - 132
  • [40] CMOS-compatible Titanium Dioxide Deposition for Athermalization of Silicon Photonic Waveguides
    Shang, Kuanping
    Djordjevic, Stevan S.
    Li, Jun
    Liao, Ling
    Basak, Juthika
    Liu, Hai-Feng
    Yoo, S. J. B.
    2013 CONFERENCE ON LASERS AND ELECTRO-OPTICS (CLEO), 2013,
12345