Structural characterization of cubic GaN grown on GaAs(001) substrates

被引:0
|
作者
Zheng, XH [1 ]
Qu, B
Wang, YT
Yang, H
Liang, JW
Han, JY
机构
[1] Chinese Acad Sci, Inst Semicond, Beijing 100083, Peoples R China
[2] Chinese Acad Geol Sci, Inst Minerals & Resources, Beijing 100037, Peoples R China
来源
CHINESE JOURNAL OF ELECTRONICS | 2001年 / 10卷 / 02期
关键词
cubic GaN; X-ray double crystal diffraction; structural characteristics;
D O I
暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Structural characteristics of cubic GaN epilayers grown on GaAs(001) were studied using X-ray double-crystal diffraction technique. The structure factors of cubic GaN(002) and (004) components are approximately identical. However, the integrated intensities of the rocking curve for cubic (002) components are over five times as those of (004) components. The discrepancy has been interpreted in detail considering other factors. In the conventional double crystal rocking curve, the peak broadening includes such information caused by the orientation distribution (mosaicity) and the distribution of lattice spacing. These two kinds of distributions can be distinguished by the triple-axis diffraction in which an analyser crystal is placed in front of the detector. Moreover, the peak broadening was analysed by reciprocal lattice construction and Eward sphere. By using triple-axis diffraction of cubic (002) and (113) components, domain size and dislocation density were estimated. The fully relaxed lattice parameter of cubic GaN was determined to be about 0.451 +/- 0.001nm.
引用
收藏
页码:219 / 222
页数:4
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